Accuracy issues in the finite difference time domain simulation of photomask scattering

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 2, 2001, Pages 1484-1491

  Pistor, Thomas V ^a  

^a Panoramic Technology Inc   (United States)

Author keywords

Accuracy; Discretization error; FDTD; Simulation; Source discretization; TEMPEST; Thin film stack

Indexed keywords

APPROXIMATION THEORY; BOUNDARY CONDITIONS; COMPUTER SIMULATION; ELECTROMAGNETISM; FINITE ELEMENT METHOD; LIGHT SCATTERING; MASKS; THIN FILMS; TIME DOMAIN ANALYSIS;

PHOTOMASK SCATTERING;

PHOTOLITHOGRAPHY;

EID: 0035758727     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435688     Document Type: Conference Paper

References (6)

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3. R.J. Socha et al., "Design of 200nm, 170nm, 140nm DUV Contact Sweeper High Transmission Attenuating Phase Shift Mask through Simulation Part 1", Proc. SPIE Vol. 3546, pp. 617-641.
4. A. Erdmann et al., "Rigorous diffraction analysis for future mask technology", Proc. SPIE Vol. 4000, pp. 684-694.
5. www.panoramictech.com, www.finle.com, www.sigma-c.com
6. A. Taflove, Computational Electrodynamics The Finite-Difference Time-Domain Method, (Artech House, 1995).