The energy influx during plasma deposition of amorphous hydrogenated carbon films

Surface and Coatings Technology

Volumn 149, Issue 2-3, 2002, Pages 206-216

  Rohde, D ^a   Pecher, P ^b   Kersten, H ^a   Jacob, W ^b   Hippler, R ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

a C:H; Carbon films; Deposition; Energy influx; Magnetron sputtering

Indexed keywords

CARBON; CONDENSATION; DEPOSITION; HYDROGENATION; MAGNETRON SPUTTERING; THIN FILMS;

ENERGY INFLUX;

COATINGS;

CARBON; DEPOSITION; ENERGY; FILM; SPUTTERING;

EID: 0037080539     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01497-9     Document Type: Article

References (32)

1. New techniques for roll coating of optical thin films
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