Shadow edge lithography for nanoscale patterning and manufacturing

Nanotechnology

Volumn 18, Issue 40, 2007, Pages

  Bai, John G ^a   Chang, Cheng Ling ^a   Chung, Jae Hyun ^a   Lee, Kyong Hoon ^b  

^a University of Washington   (United States)

^b NanoFacture Incorporated   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; LITHOGRAPHY; PHYSICAL VAPOR DEPOSITION;

NANOCHANNELS; NANOGAPS;

NANOTECHNOLOGY;

ARTICLE; DIFFUSION; NANOFABRICATION; PREDICTION; PRIORITY JOURNAL; SHADOW EDGE LITHOGRAPHY; VAPOR;

EID: 34748851242     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/40/405307     Document Type: Article

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