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Volumn 4, Issue 8, 2004, Pages 1507-1511

Sub-100 nm triangular nanopores fabricated with the reactive ion etching variant of nanosphere lithography and angle-resolved nanosphere lithography

Author keywords

[No Author keywords available]

Indexed keywords

ION;

EID: 4444306296     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl049345w     Document Type: Article
Times cited : (136)

References (24)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.