Sub-20 nm x-ray nanolithography using conventional mask technologies on monochromatized synchrotron radiation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2489-2494

  Simon, G ^a   Haghiri Gosnet, A M ^a   Bourneix, J ^a   Decanini, D ^a   Chen, Y ^a   Rousseaux, F ^a   Launois, H ^a   Vidal, B ^b  

^a CNRS   (France)

^b AIX MARSEILLE UNIVERSITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000456327     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589672     Document Type: Article

References (16)

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