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Volumn 46, Issue 9 B, 2007, Pages 6449-6453

Angled exposure method for pattering on three-dimensional structures

Author keywords

Angled exposure; Polarized light; Reflection; Spray coating; Three dimensional photolithography

Indexed keywords

ANISOTROPIC ETCHING; LIGHT POLARIZATION; PATTERN RECOGNITION; PHOTOLITHOGRAPHY; THREE DIMENSIONAL;

EID: 34648826752     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.6449     Document Type: Article
Times cited : (14)

References (14)
  • 3
    • 33745662378 scopus 로고    scopus 로고
    • IEEJ Trans. Sens. Micromach
    • 222 [in Japanese
    • K. Hanai, T. Nakahara, S. Suzuki, and Y. Matsumoto: IEEJ Trans. Sens. Micromach. 126-E (2006) 222 [in Japanese].
    • (2006) , vol.126-E
    • Hanai, K.1    Nakahara, T.2    Suzuki, S.3    Matsumoto, Y.4
  • 4
    • 34648837776 scopus 로고    scopus 로고
    • IEEJ Trans. Sens. Micromach
    • 235 [in Japanese
    • M. Sasaki, S. Nogawa, and K. Hane: IEEJ Trans. Sens. Micromach. 122-E (2002) 235 [in Japanese].
    • (2002) , vol.122-E
    • Sasaki, M.1    Nogawa, S.2    Hane, K.3
  • 14
    • 34648843948 scopus 로고    scopus 로고
    • Y. X. Liu, L. Z. Gu, M. Sasaki, K. Hane, and M. Esashi: Late News, Tech. Dig. 17th. Sensor Symp., 2000.
    • Y. X. Liu, L. Z. Gu, M. Sasaki, K. Hane, and M. Esashi: Late News, Tech. Dig. 17th. Sensor Symp., 2000.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.