Three dimensional fabrication by inclined rotary exposure

IEEJ Transactions on Sensors and Micromachines

Volumn 126, Issue 6, 2006, Pages

  Hanai, Kei ^a   Nakahara, Takashi ^a   Suzuki, Shinnya ^a   Matsumoto, Yoshinori ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

Backside exposure; Inclined rotary exposure; MEMS; Rotary stage; SU 8; Substrate penetration method

Indexed keywords

IRRADIATION; LITHOGRAPHY; PHOTORESISTORS; SOFTWARE PROTOTYPING; SUBSTRATES;

BACKSIDE EXPOSURE; INCLINED ROTARY EXPOSURE; MEMS; ROTARY STAGE; SU-8; SUBSTRATE PENETRATION METHOD;

MICROELECTROMECHANICAL DEVICES;

EID: 33745662378     PISSN: 13418939     EISSN: 13475525     Source Type: Journal    
DOI: 10.1541/ieejsmas.126.222     Document Type: Article

References (3)

1. K. Okada, F. Ohira, G. Hashiguchi, M. Hosogi, and Y. Mihara: "Fabrication of Fresnel lens shape using UV light exposure technology with tilting rotary stage", Optical MEMS 2004 proc., pp.146-147 (2004)
2. S. Shoji: "Polymer-MEMS and Its Applications", IEEJ Trans. SM, Vol. 124, No.10, pp.349-353 (2004) (in Japanese)
3. R. Mori, K. Hanai, and Y. Matsumoto: "Three Dimensional Micro Fabrication of Photoresist and Resin Materials by Using Gray-scale Lithography and Molding", IEEJ Trans. SM, Vol.124, No.10 pp.359-363 (2004) (in Japanese)