Technique for preparing defect-free spray coated resist film on three-dimensional micro-electromechanical systems

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 4 A, 2005, Pages 2016-2020

  Singh, Vijay Kumar ^a   Sasaki, Minoru ^a   Song, Jong Hyeong ^a   Hane, Kazuhiro ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Pinhole; Resist film; Spray coating; Thinner; Three dimensional photolithography

Indexed keywords

COMPUTER CONTROL; MICROELECTROMECHANICAL DEVICES; PHOTOLITHOGRAPHY; SOLENOIDS; SOLUTIONS; TEMPERATURE CONTROL; THERMOCOUPLES; THIN FILMS; THREE DIMENSIONAL; VAPORS;

PINHOLE; RESIST FILM; THINNER; THREE-DIMENSIONAL PHOTOLITHOGRAPHY;

SPRAYED COATINGS;

EID: 21244477871     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.2016     Document Type: Article

References (12)

1. S. Linder, H. Baltes, F. Gnaedinger and E. Doering: Proc. Int. Workshop Micro Electro Mechanical Systems, 1996, p. 38.
2. P. Kersten, S. Bouwstra and J. W. Petersen: Sens. & Actuat. A 51 (1995) 51.
3. M. Heschel and S. Bouwstra: Sens. & Actual. A 70 (1998) 75.
4. N. P. Pham, P. M. Sarro and J. N. Burghartz: Proc. SPIE 4174 (2000) 390.
5. N. P. Pham, P. M. Sarro, K. T. Ng and J. N. Burghartz: Proc. Micro Electro Mechanical Systems, 2001, p. 345.
6. M. Sasaki, S. Nogawa and K. Hane: Trans. IEE Jpn. 122-E (2002) 235 [in Japanese].
7. M. Sasaki, T. Ando, S. Nogawa and K. Hane: Jpn. J. Appl. Phys. 41 (2002) 4350.
8. M. Sasaki, T. Yamaguchi, J. H. Song, K. Hane, M. Hara and K. Hori: J. Lightwave Technol. 21 (2003) 602.
9. A. Kado, T. Sakai and Y. Matsumoto: Proc. 19th Sensor Symp., 2002, p. 347.
10. N. P. Pham, T. L. M. Scholtes, R. Klerk, B. Wieder, P. M. Sarro and J. N. Burghartz: Proc. SPIE 4557 (2001) 312.
11. W. J. Li, J. D. Mai and C. M. Ho: Proc. Int. Workshop Micro Electro Mechanical Systems, 1998, p. 268.
12. V. K. Singh, M. Sasaki, J. H. Song and K. Hane: Jpn. J. Appl. Phys. 42 (2003) 4027.