In situ work function study of oxidation and thin film growth on clean surfaces

Surface Science

Volumn 433, Issue , 1999, Pages 770-774

  Baikie, I D ^a   Petermann, U ^a   Lagel B ^a  

^a ROBERT GORDON UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ARGON; FILM GROWTH; ION BOMBARDMENT; OXIDATION; OXYGEN; RUTHENIUM; SCANNING ELECTRON MICROSCOPY; SURFACES; TEMPERATURE; THIN FILMS;

IN SITU WORK FUNCTION; KELVIN PROBE; SURFACE DIPOLE; ULTRAHIGH VACUUM;

SILICON;

EID: 0033308899     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)00140-5     Document Type: Article

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