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Volumn 157, Issue 4, 2000, Pages 207-211
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Bias dependence of Si(111)7×7 images observed by noncontact atomic force microscopy
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
ELECTRIC POTENTIAL;
IMAGING TECHNIQUES;
SURFACE TOPOGRAPHY;
ADHESION;
ELECTROSTATICS;
FORCE MEASUREMENT;
MICROSCOPES;
MOLECULAR DYNAMICS;
NANOTUBES;
SEMICONDUCTOR LASERS;
SILICON;
TITANIUM DIOXIDE;
VOLTAGE MEASUREMENT;
CONTRAST INVERSION;
NONCONTACT ATOMIC FORCE MICROSCOPY;
SILICON;
SURFACE CHEMISTRY;
CONTACT POTENTIAL DIFFERENCE;
DYNAMIC FORCE MICROSCOPY;
EIREV;
FOURIER EXPANSION METHOD;
FRICTION FORCE MICROSCOPY;
JOULE EXPANSION MICROSCOPE;
KELVIN PROBE FORCE MICROSCOPY;
NONCONTACT ATOMIC FORCE MICROSCOPY;
SCANNING FORCE MEASUREMENT;
SCANNING SURFACE POTENTIAL MICROSCOPY;
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EID: 0034165348
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/S0169-4332(99)00527-9 Document Type: Article |
Times cited : (46)
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References (18)
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