Low-temperature synthesis of homogeneous nanocrystalline cubic silicon carbide films

Journal of Applied Physics

Volumn 102, Issue 5, 2007, Pages

  Cheng, Qijin ^b   Xu, S ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; INDUCTIVELY COUPLED PLASMA; NANOCRYSTALLINE MATERIALS; SILICON CARBIDE; SYNTHESIS (CHEMICAL); X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION PRESSURE; HOMOGENEOUS NANOCRYSTALLINE CUBIC SILICON CARBIDES; LOW SUBSTRATE TEMPERATURE;

OXIDE FILMS;

EID: 34548632979     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2776155     Document Type: Article

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