Structural and optical investigation of plasma deposited silicon carbon alloys: Insights on Si-C bond configuration using spectroscopic ellipsometry

Journal of Applied Physics

Volumn 97, Issue 10, 2005, Pages

  Losurdo, Maria ^a   Giangregorio, Maria ^a   Capezzuto, Pio ^a   Bruno, Giovanni ^a   Giorgis, Fabrizio ^b,c  

^a UNIVERSITY OF BARI   (Italy)

^b POLITECNICO DI TORINO   (Italy)

^c Material and Microsystems Laboratory X Lab   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON CONTENT; FEED MIXTURES; MICROCRYSTALLINITY; TETRAHEDRON MODEL;

CARBON; ELLIPSOMETRY; INFRARED SPECTROSCOPY; MICROSTRUCTURE; OPTICAL PROPERTIES; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SILICON CARBIDE; SPECTROSCOPIC ANALYSIS; THIN FILMS;

SILICON ALLOYS;

EID: 20844463869     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1899758     Document Type: Article

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