Surface free energy of cubic boron nitride films deposited on nanodiamond

Journal of Physical Chemistry C

Volumn 111, Issue 34, 2007, Pages 12768-12772

  Spiesser, A ^a,d   Chong, Y M ^b   Leung, K M ^a,b   Abel, G ^c   Ross, G G ^c   Walzak, M J ^a   Jacklin, R ^a   Lau, W M ^a   Zhang, W J ^b   Bello, I ^a,c  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

^b INRS EMT   (Canada)

^c CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^d AIX MARSEILLE UNIVERSITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; FILM THICKNESS; FREE ENERGY; INTERFACIAL ENERGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STOICHIOMETRY; SURFACE ROUGHNESS; THICK FILMS; THIN FILMS;

MATERIAL COMPATIBILITY; NANODIAMONDS; PRETREATMENT; SURFACE FREE ENERGY;

CUBIC BORON NITRIDE;

EID: 34548546662     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp0732561     Document Type: Article

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