Annealing behavior and hardness enhancement of amorphous SiCN thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 5, 2007, Pages 1407-1410

  Ma, S L ^a   Xu, B ^a   Xu, K W ^a   Wu, X L ^b   Chu, Paul K ^c  

^a XI'AN JIAOTONG UNIVERSITY   (China)

^b NANJING UNIVERSITY   (China)

^c CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; DEPOSITION; MAGNETRON SPUTTERING; PHASE TRANSITIONS; SILICON COMPOUNDS; STAINLESS STEEL;

POLYCRYSTALLINE TRANSFORMATIONS; RADIO FREQUENCY MAGNETRON SPUTTERING; SILICON CARBON NITROGEN (SICN) FILMS; THERMODYNAMICS MECHANISMS;

AMORPHOUS FILMS;

EID: 34548220410     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2764080     Document Type: Article

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