Chemical bonding in carbon nitride films studied by X-ray spectroscopies

Diamond and Related Materials

Volumn 10, Issue 9-10, 2001, Pages 1897-1900

  Zheng, W T ^a,b,c,d   Guo, J H ^e   Sakamoto, Y ^b   Takaya, M ^b   Li, X T ^a   Chao, P J ^a   Jin, Z S ^a   Xing, K Z ^c   Sundgren, J E ^c  

^a JILIN UNIVERSITY   (China)

^b CHIBA INSTITUTE OF TECHNOLOGY   (Japan)

^c LINKÖPING UNIVERSITY   (Sweden)

^d DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^e UPPSALA UNIVERSITY   (Sweden)

Author keywords

Carbon nitride film; Chemical bonding; Magnetron sputtering; X ray spectroscopies

Indexed keywords

BINDING AFFINITY; CARBON NITRIDE; CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY; FILM; MATERIAL FORMS AND STATES; NITROGEN; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL BONDS; EMISSION SPECTROSCOPY; NITRIDES; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY SPECTROSCOPY;

X RAY ABSORPTION FINE STRUCTURE;

DIAMONDS;

CARBON NITRIDE;

EID: 0035447469     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00432-0     Document Type: Article

References (14)