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Volumn 61, Issue 25, 2007, Pages 4731-4734

Effect of substrate temperature on HWCVD deposited a-SiC:H film

Author keywords

a SiC:H; FTIR; HWCVD; Photoluminescence; Raman

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PHOTOLUMINESCENCE; SILICON COMPOUNDS;

EID: 34548126966     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2007.03.029     Document Type: Article
Times cited : (25)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.