Human serum albumin (HSA) adsorption onto a-SiC:H thin films deposited by hot wire chemical vapor deposition

Applied Surface Science

Volumn 253, Issue 4, 2006, Pages 2310-2314

  Swain, Bibhu P ^a,b  

^a INDIAN INSTITUTE OF TECHNOLOGY BOMBAY   (India)

^b INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

Author keywords

AFM; Contact angle; FTIR; HWCVD; XPS

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CONTACT ANGLE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INTERFACIAL ENERGY; SILICON CARBIDE; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CONTACT ANGLE MEASUREMENT; HOT WIRE CHEMICAL VAPOR DEPOSITION (HWCVD); HUMAN SERUM ALBUMIN (HSA);

PROTEINS;

EID: 33751242460     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.04.048     Document Type: Article

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