Effect of energetic particle bombardment on microstructure of zinc oxide films deposited by RF magnetron sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 7 A, 2007, Pages 4038-4041

  Furuta, Mamoru ^a   Hiramatsu, Takahiro ^b   Matsuda, Tokiyoshi ^a   Furuta, Hiroshi ^a   Hirao, Takashi ^a  

^a KOCHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b CASIO   (Japan)

Author keywords

Average crystallite size; Optical emission spectroscopy; Rf sputtering; X ray diffraction; Zinc oxide

Indexed keywords

DEPOSITION; FILMS; ION BOMBARDMENT; MAGNETRON SPUTTERING; MICROSTRUCTURE; ZINC OXIDE;

AVERAGE CRYSTALLITE SIZE; RF SPUTTERING;

HIGH ENERGY PHYSICS;

EID: 34547838365     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.4038     Document Type: Article

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