On a more accurate assessment of scaled copper/low-k interconnects performance

IEEE Transactions on Semiconductor Manufacturing

Volumn 20, Issue 3, 2007, Pages 333-340

  Travaly, Youssef ^a   Mandeep, Bamal ^a,b   Carboneil, Laureen ^a   Tökei, Zsolt ^a   Van Olmen, Jan ^a   Iacopi, Francesca ^a   Van Hove, Marleen ^a   Stucchi, Michele ^a   Maex, Karen ^a,b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

Capacitance; Copper; Delay circuit; Modeling; RC circuits; Resistivity; Variability

Indexed keywords

COPPER; ELECTRIC CONDUCTIVITY; PERMITTIVITY; STATISTICAL METHODS;

DELAY CIRCUIT; RC CIRCUITS; RESPONSE SURFACE MODELS (RSM);

OPTICAL INTERCONNECTS;

EID: 34547819185     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2007.901822     Document Type: Conference Paper

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