Electrical Equivalent Sidewall Damage in Patterned Low-k Dielectrics

Electrochemical and Solid-State Letters

Volumn 7, Issue 4, 2004, Pages

  Iacopi, F ^a,b   Stucchi, M ^a   Richard, O ^a   Maex, K ^a,b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; ETCHING; EXTRAPOLATION; MATHEMATICAL MODELS; OXIDATION; PERMITTIVITY; PHYSICAL VAPOR DEPOSITION; POROSITY;

INTERLINE DIELECTRICS; SIDEWALL DAMAGE;

DIELECTRIC MATERIALS;

EID: 1842425374     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1649401     Document Type: Article

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