Resistivity increase in ultrafine-line copper conductor for ULSIs

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 40, Issue 10 B, 2001, Pages

  Hinode, K ^a   Hanaoka, Y ^a   Takeda, K ^a   Kondo, S ^a  

^a HITACHI LTD   (Japan)

Author keywords

Copper; Damascene; Electron mean free path; Fine line; Matthiessen's rule; Resistivity increase

Indexed keywords

CHEMICAL POLISHING; COPPER; ELECTRIC CONDUCTIVITY OF SOLIDS; MATHEMATICAL MODELS; SCANNING ELECTRON MICROSCOPY; THIN FILMS; ULSI CIRCUITS;

DAMASCENE; ELECTRON MEAN FREE PATH;

ELECTRIC CONDUCTORS;

EID: 0035888669     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.l1097     Document Type: Letter

References (8)