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Volumn 38, Issue 7, 2002, Pages 677-682

Chemical vapor deposition of boron nitride in the B-N-H-He-O system

Author keywords

[No Author keywords available]

Indexed keywords

BORON DERIVATIVE; BORON NITRIDE; HELIUM; HYDROGEN; NITROGEN; OXYGEN; UNCLASSIFIED DRUG;

EID: 3442877060     PISSN: 00201685     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1016236324197     Document Type: Article
Times cited : (2)

References (41)
  • 1
    • 0017016498 scopus 로고
    • Structure and Properties of Boron Nitride Films Grown by High Temperature Reactive Plasma Deposition
    • Hyder, S.B. and Yep, T.O., Structure and Properties of Boron Nitride Films Grown by High Temperature Reactive Plasma Deposition, J. Electrochem. Soc., 1976, vol. 123, no. 11, pp. 1721-1724.
    • (1976) J. Electrochem. Soc. , vol.123 , Issue.11 , pp. 1721-1724
    • Hyder, S.B.1    Yep, T.O.2
  • 2
    • 0020908345 scopus 로고
    • 3 Mixtures: A Thermodynamic and Experimental Approach
    • 3 Mixtures: A Thermodynamic and Experimental Approach, J. Less-Common Met., 1983, vol. 95, no. 2, pp. 221-246.
    • (1983) J. Less-Common Met. , vol.95 , Issue.2 , pp. 221-246
    • Hannache, H.1    Naslain, R.2    Bernard, C.3
  • 3
    • 0019616843 scopus 로고
    • Chemical Vapour Deposition of Thin Films of BN onto Fused Silica and Sapphire
    • Sano, M. and Aoki, M., Chemical Vapour Deposition of Thin Films of BN onto Fused Silica and Sapphire, Thin Solid Films, 1981, vol. 83, no. 2, pp. 247-251.
    • (1981) Thin Solid Films , vol.83 , Issue.2 , pp. 247-251
    • Sano, M.1    Aoki, M.2
  • 4
    • 0040711715 scopus 로고
    • Preparation of Boron Nitride Thin Films by Chemical Vapor Deposition
    • Nakamura, K., Preparation of Boron Nitride Thin Films by Chemical Vapor Deposition, Mater. Sci. Forum, 1990, vol. 54/55, pp. 111-140.
    • (1990) Mater. Sci. Forum , vol.54-55 , pp. 111-140
    • Nakamura, K.1
  • 5
    • 0023983962 scopus 로고
    • Reflectance Spectra of BN Materials in the Vacuum Ultraviolet
    • Chayahara, A., Yokoyama, H., Imura, T., et al., Reflectance Spectra of BN Materials in the Vacuum Ultraviolet, Jpn. J. Appl. Phys., 1988, vol. 27, no. 3, pp. 440-441.
    • (1988) Jpn. J. Appl. Phys. , vol.27 , Issue.3 , pp. 440-441
    • Chayahara, A.1    Yokoyama, H.2    Imura, T.3
  • 6
    • 9644264440 scopus 로고    scopus 로고
    • Structure of the Nitride Films, Obtained by RPECVD from Borazine
    • Smirnova, T.P., Terauchi, M., Sato, P., et al., Structure of the Nitride Films, Obtained by RPECVD from Borazine, Chem. Sustainable Dev., 2000, vol. 8, pp. 63-67.
    • (2000) Chem. Sustainable Dev. , vol.8 , pp. 63-67
    • Smirnova, T.P.1    Terauchi, M.2    Sato, P.3
  • 8
    • 0003900244 scopus 로고
    • Plasma Deposition of BN, BCN:H, and Me-BCN:H Films Using N-Trimethylborazine (Me = Tl, Nb)
    • Proc. 8th Eur. Conf. on CVD (Glasgow, 1991), Sect. 3
    • Weber, A., Bringmann, U., Klages, C.P., et al., Plasma Deposition of BN, BCN:H, and Me-BCN:H Films Using N-Trimethylborazine (Me = Tl, Nb), Proc. 8th Eur. Conf. on CVD (Glasgow, 1991), J. Phys., Sect. 3, 1992, vol. 2, no. 8, pp. 1391-1398.
    • (1992) J. Phys. , vol.2 , Issue.8 , pp. 1391-1398
    • Weber, A.1    Bringmann, U.2    Klages, C.P.3
  • 9
    • 17744401945 scopus 로고    scopus 로고
    • A Novel Approach to Deposition of Cubic Boron Nitride Coatings
    • Konyashin, I., Loeffler, J., Bill, J., and Aldinger, F., A Novel Approach to Deposition of Cubic Boron Nitride Coatings, Thin Solid Films, 1997, vol. 308/309, no. 1/2, pp. 101-106.
    • (1997) Thin Solid Films , vol.308-309 , Issue.1-2 , pp. 101-106
    • Konyashin, I.1    Loeffler, J.2    Bill, J.3    Aldinger, F.4
  • 11
    • 0024090211 scopus 로고
    • Thermodynamic Analysis of the Refining of Technical Boron Nitride
    • Leitner, J., Vonka, P., Brozek, V., and Hubacek, M., Thermodynamic Analysis of the Refining of Technical Boron Nitride, J. Mater. Sci., 1988, vol. 23, no. 10, pp. 3594-3599.
    • (1988) J. Mater. Sci. , vol.23 , Issue.10 , pp. 3594-3599
    • Leitner, J.1    Vonka, P.2    Brozek, V.3    Hubacek, M.4
  • 12
    • 0022506398 scopus 로고
    • 4〉-〈BN〉 Coatings
    • 4〉-〈BN〉 Coatings, J. Am. Ceram. Soc., 1986, vol. 69, no. 1, pp. 69-74.
    • (1986) J. Am. Ceram. Soc. , vol.69 , Issue.1 , pp. 69-74
    • Besmann, T.M.1
  • 13
    • 0027562434 scopus 로고
    • Growth of Cubic Boron Nitride by Chemical Vapor Deposition and High-Pressure High-Temperature Synthesis
    • Demazeau, G., Growth of Cubic Boron Nitride by Chemical Vapor Deposition and High-Pressure High-Temperature Synthesis, Diamond Relat. Mater., 1993, vol. 2, nos. 2-4, pp. 197-200.
    • (1993) Diamond Relat. Mater. , vol.2 , Issue.2-4 , pp. 197-200
    • Demazeau, G.1
  • 14
    • 0342759063 scopus 로고
    • On the Phase Diagram of Boron Nitride
    • Solozhenko, V.L., On the Phase Diagram of Boron Nitride, Dokl. Akad. Nauk SSSR, 1988, vol. 301, no. 1, pp. 147-149.
    • (1988) Dokl. Akad. Nauk SSSR , vol.301 , Issue.1 , pp. 147-149
    • Solozhenko, V.L.1
  • 15
    • 0002637792 scopus 로고
    • Current Trends in the Phase Diagram of Boron Nitride
    • Solozhenko, V.L., Current Trends in the Phase Diagram of Boron Nitride, J. Hard Mater., 1995, vol. 6, no. 1, pp. 51-65.
    • (1995) J. Hard Mater. , vol.6 , Issue.1 , pp. 51-65
    • Solozhenko, V.L.1
  • 16
    • 0000378774 scopus 로고    scopus 로고
    • Refined Phase Diagram of Boron Nitride
    • Solozhenko, V.L., Turkevich, V.Z., and Holzapfel, W.B., Refined Phase Diagram of Boron Nitride, J. Phys. Chem., 1999, vol. 103, no. 8, pp. 2903-2905.
    • (1999) J. Phys. Chem. , vol.103 , Issue.8 , pp. 2903-2905
    • Solozhenko, V.L.1    Turkevich, V.Z.2    Holzapfel, W.B.3
  • 17
    • 0030682310 scopus 로고    scopus 로고
    • On Thermodynamic Equilibria of the Solid BN and Gas Phases in B-N-H-Cl-He System
    • Golubenko, A.N., Kosinova, M.L., Titov, V.A., et al., On Thermodynamic Equilibria of the Solid BN and Gas Phases in B-N-H-Cl-He System, Thin Solid Films, 1996, vol. 293, no. 1/2, pp. 11-16.
    • (1996) Thin Solid Films , vol.293 , Issue.1-2 , pp. 11-16
    • Golubenko, A.N.1    Kosinova, M.L.2    Titov, V.A.3
  • 18
    • 2542597795 scopus 로고    scopus 로고
    • Thermodynamic Modeling of Boron Nitride Chemical Vapor Deposition in the B-N-H-He System
    • Kosinova, M.L., Golubenko, A.N., and Kuznetsov, F.A., Thermodynamic Modeling of Boron Nitride Chemical Vapor Deposition in the B-N-H-He System, Neorg. Mater., 1998, vol. 34, no. 2, pp. 184-188 [Inorg. Mater. (Engl. Transl.), vol. 34, no. 2, pp. 132-136].
    • (1998) Neorg. Mater. , vol.34 , Issue.2 , pp. 184-188
    • Kosinova, M.L.1    Golubenko, A.N.2    Kuznetsov, F.A.3
  • 19
    • 2542597795 scopus 로고    scopus 로고
    • Kosinova, M.L., Golubenko, A.N., and Kuznetsov, F.A., Thermodynamic Modeling of Boron Nitride Chemical Vapor Deposition in the B-N-H-He System, Neorg. Mater., 1998, vol. 34, no. 2, pp. 184-188 [Inorg. Mater. (Engl. Transl.), vol. 34, no. 2, pp. 132-136].
    • Inorg. Mater. (Engl. Transl.) , vol.34 , Issue.2 , pp. 132-136
  • 20
    • 0031547421 scopus 로고    scopus 로고
    • A Thermodynamic Approach to Chemical Vapor Deposition of Boron Nitride Thin Films from Borazine
    • Kuznetsov, F.A., Golubenko, A.N., and Kosinova, M.L., A Thermodynamic Approach to Chemical Vapor Deposition of Boron Nitride Thin Films from Borazine, Appl. Surf. Sci., 1997, vol. 113/114, no. 1/2, pp. 638-641.
    • (1997) Appl. Surf. Sci. , vol.113-114 , Issue.1-2 , pp. 638-641
    • Kuznetsov, F.A.1    Golubenko, A.N.2    Kosinova, M.L.3
  • 21
    • 2542571362 scopus 로고
    • x:H Dielectric Layers Prepared by Field-Assisted Plasma-Enhanced Chemical Vapor Deposition
    • x:H Dielectric Layers Prepared by Field-Assisted Plasma-Enhanced Chemical Vapor Deposition, Neorg. Mater., 1995, vol. 31, no. 12, pp. 1541-1544 [Inorg. Mater. (Engl. Transl.), vol. 31, no. 12, pp. 1400-1403].
    • (1995) Neorg. Mater. , vol.31 , Issue.12 , pp. 1541-1544
    • Sal'man, E.G.1    Kosinova, M.L.2    Korshunov, A.N.3
  • 22
    • 9644299941 scopus 로고    scopus 로고
    • x:H Dielectric Layers Prepared by Field-Assisted Plasma-Enhanced Chemical Vapor Deposition, Neorg. Mater., 1995, vol. 31, no. 12, pp. 1541-1544 [Inorg. Mater. (Engl. Transl.), vol. 31, no. 12, pp. 1400-1403].
    • Inorg. Mater. (Engl. Transl.) , vol.31 , Issue.12 , pp. 1400-1403
  • 27
    • 0024068491 scopus 로고
    • Properties of BN Thin Films Deposited by Plasma CVD
    • Chayahara, A., Yokoyama, H., Imura, T., and Osaka, Yu., Properties of BN Thin Films Deposited by Plasma CVD, Appl. Surf. Sci., 1988, vol. 33/34, no. 1/2, pp. 561-566.
    • (1988) Appl. Surf. Sci. , vol.33-34 , Issue.1-2 , pp. 561-566
    • Chayahara, A.1    Yokoyama, H.2    Imura, T.3    Osaka, Yu.4
  • 28
    • 0001345836 scopus 로고
    • Effects of the Substrate Bias on the Formation of Cubic Boron Nitride by Inductively-Coupled Plasma Enhanced Chemical Vapor Deposition
    • Ichiki, T., Momose, T., and Yoshida, T., Effects of the Substrate Bias on the Formation of Cubic Boron Nitride by Inductively-Coupled Plasma Enhanced Chemical Vapor Deposition, J. Appl. Phys., 1994, vol. 75, no. 3, pp. 1330-1333.
    • (1994) J. Appl. Phys. , vol.75 , Issue.3 , pp. 1330-1333
    • Ichiki, T.1    Momose, T.2    Yoshida, T.3
  • 29
    • 0033362545 scopus 로고    scopus 로고
    • Cubic Boron Nitride Thin Film Synthesis on Silica Substrates by Low-Pressure Inductively-Coupled r.f. Plasma Chemical Vapor Deposition
    • Chattopadhyay, K.K., Matsumoto, S., Zhang, Y.-F., et al., Cubic Boron Nitride Thin Film Synthesis on Silica Substrates by Low-Pressure Inductively-Coupled r.f. Plasma Chemical Vapor Deposition, Thin Solid Films, 1999, vol. 354, no. 1/2, pp. 24-28.
    • (1999) Thin Solid Films , vol.354 , Issue.1-2 , pp. 24-28
    • Chattopadhyay, K.K.1    Matsumoto, S.2    Zhang, Y.-F.3
  • 30
    • 0026930713 scopus 로고
    • Formation and Properties of Cubic Boron Nitride Films on Tungsten Carbide by Plasma Chemical Vapor Deposition
    • Okamoato, M., Utsumi, Yo., and Osaka, Yu., Formation and Properties of Cubic Boron Nitride Films on Tungsten Carbide by Plasma Chemical Vapor Deposition, Jpn. J. Appl. Phys., Part 1, 1992, vol. 31, no. 10, pp. 3455-3460.
    • (1992) Jpn. J. Appl. Phys., Part 1 , vol.31 , Issue.10 , pp. 3455-3460
    • Okamoato, M.1    Utsumi, Yo.2    Osaka, Yu.3
  • 31
    • 0029485320 scopus 로고
    • Comparison of the Properties of BN Films Synthesized by Inductively Coupled r.f. and Microwave Plasmas
    • Kiel, F., Cotarelo, M., Delplancke, M.P., and Winand, R., Comparison of the Properties of BN Films Synthesized by Inductively Coupled r.f. and Microwave Plasmas, Thin Solid Films, 1995, vol. 270, no. 1/2, pp. 118-123.
    • (1995) Thin Solid Films , vol.270 , Issue.1-2 , pp. 118-123
    • Kiel, F.1    Cotarelo, M.2    Delplancke, M.P.3    Winand, R.4
  • 32
    • 0000843314 scopus 로고    scopus 로고
    • Electron Emission Characteristics of Boron Nitride Films Synthesized by Plasma-Assisted Chemical Vapor Deposition
    • Sugino, T., Kawasaki, S., Tanioka, K., and Shirafuji, Ju., Electron Emission Characteristics of Boron Nitride Films Synthesized by Plasma-Assisted Chemical Vapor Deposition, J. Vac. Sci. Technol., B, 1998, vol. 16, no. 3, pp. 1211-1214.
    • (1998) J. Vac. Sci. Technol., B , vol.16 , Issue.3 , pp. 1211-1214
    • Sugino, T.1    Kawasaki, S.2    Tanioka, K.3    Shirafuji, Ju.4
  • 33
    • 0031996235 scopus 로고    scopus 로고
    • Electron Emission from Nanocrystalline Boron Nitride Films Synthesized by Plasma-Assisted Chemical Vapor Deposition
    • Sugino, T., Tanioka, K., Kawasaki, S., and Shirafuji, Ju, Electron Emission from Nanocrystalline Boron Nitride Films Synthesized by Plasma-Assisted Chemical Vapor Deposition, Diamond Relat. Mater., 1998, vol. 7, nos. 2-5, pp. 632-635.
    • (1998) Diamond Relat. Mater. , vol.7 , Issue.2-5 , pp. 632-635
    • Sugino, T.1    Tanioka, K.2    Kawasaki, S.3    Shirafuji, Ju.4
  • 34
    • 84953679203 scopus 로고
    • Composition and Structure of Boron Nitride Films Deposited by Chemical Vapor Deposition from Borazine
    • Kouvetakis, J., Patel, V.V., Miller, C.W., and Beach, D.B., Composition and Structure of Boron Nitride Films Deposited by Chemical Vapor Deposition from Borazine, J. Vac. Sci. Technol., A, 1990, vol. 8, no. 6, pp. 3929-3933.
    • (1990) J. Vac. Sci. Technol., A , vol.8 , Issue.6 , pp. 3929-3933
    • Kouvetakis, J.1    Patel, V.V.2    Miller, C.W.3    Beach, D.B.4
  • 35
    • 0003029029 scopus 로고
    • Hot Filament Activated Chemical Vapor Deposition of Boron Nitride
    • Rye, R.R., Hot Filament Activated Chemical Vapor Deposition of Boron Nitride, J. Vac. Sci. Technol., A, 1991, vol. 9, no. 3, pp. 1099-1103.
    • (1991) J. Vac. Sci. Technol., A , vol.9 , Issue.3 , pp. 1099-1103
    • Rye, R.R.1
  • 36
    • 43949164293 scopus 로고
    • Boron Nitride Thin Films by Microwave ECR Plasma Chemical Vapor Deposition
    • Paisley, M.J., Bourget, L.P., and Davis, R.F., Boron Nitride Thin Films by Microwave ECR Plasma Chemical Vapor Deposition, Thin Solid Films, 1993, vol. 235, no. 1/2, pp. 30-34.
    • (1993) Thin Solid Films , vol.235 , Issue.1-2 , pp. 30-34
    • Paisley, M.J.1    Bourget, L.P.2    Davis, R.F.3
  • 37
    • 84957232547 scopus 로고
    • Boron Nitride Thin Film Deposition Using Electron Cyclotron Resonance Microwave Plasmas
    • Gorbatkin, S.M., Burgie, R.F., Oliver, W.Q., et al., Boron Nitride Thin Film Deposition Using Electron Cyclotron Resonance Microwave Plasmas, J. Vac. Sci. Technol., A, 1993, vol. 11, no. 4, pp. 1863-1869.
    • (1993) J. Vac. Sci. Technol., A , vol.11 , Issue.4 , pp. 1863-1869
    • Gorbatkin, S.M.1    Burgie, R.F.2    Oliver, W.Q.3
  • 38
    • 3442894835 scopus 로고
    • Chemical Vapor Deposition of Boron Nitride Films Activated by UV KrF Excimer Laser Pulses
    • Moscow
    • Ugarov, M.V., Ageev, V.P., and Konov, V.I., Chemical Vapor Deposition of Boron Nitride Films Activated by UV KrF Excimer Laser Pulses, Kvantovaya Elektron. (Moscow), 1995, vol. 22, no. 7, pp. 706-710.
    • (1995) Kvantovaya Elektron. , vol.22 , Issue.7 , pp. 706-710
    • Ugarov, M.V.1    Ageev, V.P.2    Konov, V.I.3
  • 39
    • 0030408643 scopus 로고    scopus 로고
    • Synthesis of Cubic Boron Nitride Films Using a Helicon Wave Plasma and Reduction of Compressive Stress
    • Kim, I.-H., Kim, K.-S., Kim, S.-H., and Lee, S.-R., Synthesis of Cubic Boron Nitride Films Using a Helicon Wave Plasma and Reduction of Compressive Stress, Thin Solid Films, 1996, vol. 290/291, no. 1, pp. 120-125.
    • (1996) Thin Solid Films , vol.290-291 , Issue.1 , pp. 120-125
    • Kim, I.-H.1    Kim, K.-S.2    Kim, S.-H.3    Lee, S.-R.4
  • 40
    • 0033328341 scopus 로고    scopus 로고
    • The Parameters of Equilibrium between Oxygen Solid Solutions in Cubic and Graphite-like Hexagonal Boron Nitrides
    • Turkevich, V.Z., The Parameters of Equilibrium between Oxygen Solid Solutions in Cubic and Graphite-like Hexagonal Boron Nitrides, Diamond Relat. Mater., 1999, vol. 8, no. 11, pp. 2032-2035.
    • (1999) Diamond Relat. Mater. , vol.8 , Issue.11 , pp. 2032-2035
    • Turkevich, V.Z.1
  • 41
    • 0001122859 scopus 로고    scopus 로고
    • Investigation of the c-BN/h-BN Phase Transformation at Normal Pressure
    • Sachdev, H., Haubner, R., Nöth, H., and Lux, B., Investigation of the c-BN/h-BN Phase Transformation at Normal Pressure, Diamond Relat. Mater., 1997, vol. 6, nos. 2-4, pp. 286-292.
    • (1997) Diamond Relat. Mater. , vol.6 , Issue.2-4 , pp. 286-292
    • Sachdev, H.1    Haubner, R.2    Nöth, H.3    Lux, B.4


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