-
1
-
-
0017016498
-
Structure and Properties of Boron Nitride Films Grown by High Temperature Reactive Plasma Deposition
-
Hyder, S.B. and Yep, T.O., Structure and Properties of Boron Nitride Films Grown by High Temperature Reactive Plasma Deposition, J. Electrochem. Soc., 1976, vol. 123, no. 11, pp. 1721-1724.
-
(1976)
J. Electrochem. Soc.
, vol.123
, Issue.11
, pp. 1721-1724
-
-
Hyder, S.B.1
Yep, T.O.2
-
2
-
-
0020908345
-
3 Mixtures: A Thermodynamic and Experimental Approach
-
3 Mixtures: A Thermodynamic and Experimental Approach, J. Less-Common Met., 1983, vol. 95, no. 2, pp. 221-246.
-
(1983)
J. Less-Common Met.
, vol.95
, Issue.2
, pp. 221-246
-
-
Hannache, H.1
Naslain, R.2
Bernard, C.3
-
3
-
-
0019616843
-
Chemical Vapour Deposition of Thin Films of BN onto Fused Silica and Sapphire
-
Sano, M. and Aoki, M., Chemical Vapour Deposition of Thin Films of BN onto Fused Silica and Sapphire, Thin Solid Films, 1981, vol. 83, no. 2, pp. 247-251.
-
(1981)
Thin Solid Films
, vol.83
, Issue.2
, pp. 247-251
-
-
Sano, M.1
Aoki, M.2
-
4
-
-
0040711715
-
Preparation of Boron Nitride Thin Films by Chemical Vapor Deposition
-
Nakamura, K., Preparation of Boron Nitride Thin Films by Chemical Vapor Deposition, Mater. Sci. Forum, 1990, vol. 54/55, pp. 111-140.
-
(1990)
Mater. Sci. Forum
, vol.54-55
, pp. 111-140
-
-
Nakamura, K.1
-
5
-
-
0023983962
-
Reflectance Spectra of BN Materials in the Vacuum Ultraviolet
-
Chayahara, A., Yokoyama, H., Imura, T., et al., Reflectance Spectra of BN Materials in the Vacuum Ultraviolet, Jpn. J. Appl. Phys., 1988, vol. 27, no. 3, pp. 440-441.
-
(1988)
Jpn. J. Appl. Phys.
, vol.27
, Issue.3
, pp. 440-441
-
-
Chayahara, A.1
Yokoyama, H.2
Imura, T.3
-
6
-
-
9644264440
-
Structure of the Nitride Films, Obtained by RPECVD from Borazine
-
Smirnova, T.P., Terauchi, M., Sato, P., et al., Structure of the Nitride Films, Obtained by RPECVD from Borazine, Chem. Sustainable Dev., 2000, vol. 8, pp. 63-67.
-
(2000)
Chem. Sustainable Dev.
, vol.8
, pp. 63-67
-
-
Smirnova, T.P.1
Terauchi, M.2
Sato, P.3
-
7
-
-
0003936266
-
2
-
2, Inorg. Chim. Acta, 1992, vol. 202, no. 1, pp. 49-52.
-
(1992)
Inorg. Chim. Acta
, vol.202
, Issue.1
, pp. 49-52
-
-
Atchekzai, J.1
Guilhon, F.2
Mongeot, H.3
Frange, B.4
-
8
-
-
0003900244
-
Plasma Deposition of BN, BCN:H, and Me-BCN:H Films Using N-Trimethylborazine (Me = Tl, Nb)
-
Proc. 8th Eur. Conf. on CVD (Glasgow, 1991), Sect. 3
-
Weber, A., Bringmann, U., Klages, C.P., et al., Plasma Deposition of BN, BCN:H, and Me-BCN:H Films Using N-Trimethylborazine (Me = Tl, Nb), Proc. 8th Eur. Conf. on CVD (Glasgow, 1991), J. Phys., Sect. 3, 1992, vol. 2, no. 8, pp. 1391-1398.
-
(1992)
J. Phys.
, vol.2
, Issue.8
, pp. 1391-1398
-
-
Weber, A.1
Bringmann, U.2
Klages, C.P.3
-
9
-
-
17744401945
-
A Novel Approach to Deposition of Cubic Boron Nitride Coatings
-
Konyashin, I., Loeffler, J., Bill, J., and Aldinger, F., A Novel Approach to Deposition of Cubic Boron Nitride Coatings, Thin Solid Films, 1997, vol. 308/309, no. 1/2, pp. 101-106.
-
(1997)
Thin Solid Films
, vol.308-309
, Issue.1-2
, pp. 101-106
-
-
Konyashin, I.1
Loeffler, J.2
Bill, J.3
Aldinger, F.4
-
10
-
-
0026258859
-
3 Precursor
-
3 Precursor, J. Alloys Compd., 1991, vol. 176, no.2, pp. 187-213.
-
(1991)
J. Alloys Compd.
, vol.176
, Issue.2
, pp. 187-213
-
-
Dugne, O.1
Prouhet, S.2
Guette, A.3
-
11
-
-
0024090211
-
Thermodynamic Analysis of the Refining of Technical Boron Nitride
-
Leitner, J., Vonka, P., Brozek, V., and Hubacek, M., Thermodynamic Analysis of the Refining of Technical Boron Nitride, J. Mater. Sci., 1988, vol. 23, no. 10, pp. 3594-3599.
-
(1988)
J. Mater. Sci.
, vol.23
, Issue.10
, pp. 3594-3599
-
-
Leitner, J.1
Vonka, P.2
Brozek, V.3
Hubacek, M.4
-
12
-
-
0022506398
-
4〉-〈BN〉 Coatings
-
4〉-〈BN〉 Coatings, J. Am. Ceram. Soc., 1986, vol. 69, no. 1, pp. 69-74.
-
(1986)
J. Am. Ceram. Soc.
, vol.69
, Issue.1
, pp. 69-74
-
-
Besmann, T.M.1
-
13
-
-
0027562434
-
Growth of Cubic Boron Nitride by Chemical Vapor Deposition and High-Pressure High-Temperature Synthesis
-
Demazeau, G., Growth of Cubic Boron Nitride by Chemical Vapor Deposition and High-Pressure High-Temperature Synthesis, Diamond Relat. Mater., 1993, vol. 2, nos. 2-4, pp. 197-200.
-
(1993)
Diamond Relat. Mater.
, vol.2
, Issue.2-4
, pp. 197-200
-
-
Demazeau, G.1
-
14
-
-
0342759063
-
On the Phase Diagram of Boron Nitride
-
Solozhenko, V.L., On the Phase Diagram of Boron Nitride, Dokl. Akad. Nauk SSSR, 1988, vol. 301, no. 1, pp. 147-149.
-
(1988)
Dokl. Akad. Nauk SSSR
, vol.301
, Issue.1
, pp. 147-149
-
-
Solozhenko, V.L.1
-
15
-
-
0002637792
-
Current Trends in the Phase Diagram of Boron Nitride
-
Solozhenko, V.L., Current Trends in the Phase Diagram of Boron Nitride, J. Hard Mater., 1995, vol. 6, no. 1, pp. 51-65.
-
(1995)
J. Hard Mater.
, vol.6
, Issue.1
, pp. 51-65
-
-
Solozhenko, V.L.1
-
16
-
-
0000378774
-
Refined Phase Diagram of Boron Nitride
-
Solozhenko, V.L., Turkevich, V.Z., and Holzapfel, W.B., Refined Phase Diagram of Boron Nitride, J. Phys. Chem., 1999, vol. 103, no. 8, pp. 2903-2905.
-
(1999)
J. Phys. Chem.
, vol.103
, Issue.8
, pp. 2903-2905
-
-
Solozhenko, V.L.1
Turkevich, V.Z.2
Holzapfel, W.B.3
-
17
-
-
0030682310
-
On Thermodynamic Equilibria of the Solid BN and Gas Phases in B-N-H-Cl-He System
-
Golubenko, A.N., Kosinova, M.L., Titov, V.A., et al., On Thermodynamic Equilibria of the Solid BN and Gas Phases in B-N-H-Cl-He System, Thin Solid Films, 1996, vol. 293, no. 1/2, pp. 11-16.
-
(1996)
Thin Solid Films
, vol.293
, Issue.1-2
, pp. 11-16
-
-
Golubenko, A.N.1
Kosinova, M.L.2
Titov, V.A.3
-
18
-
-
2542597795
-
Thermodynamic Modeling of Boron Nitride Chemical Vapor Deposition in the B-N-H-He System
-
Kosinova, M.L., Golubenko, A.N., and Kuznetsov, F.A., Thermodynamic Modeling of Boron Nitride Chemical Vapor Deposition in the B-N-H-He System, Neorg. Mater., 1998, vol. 34, no. 2, pp. 184-188 [Inorg. Mater. (Engl. Transl.), vol. 34, no. 2, pp. 132-136].
-
(1998)
Neorg. Mater.
, vol.34
, Issue.2
, pp. 184-188
-
-
Kosinova, M.L.1
Golubenko, A.N.2
Kuznetsov, F.A.3
-
19
-
-
2542597795
-
-
Kosinova, M.L., Golubenko, A.N., and Kuznetsov, F.A., Thermodynamic Modeling of Boron Nitride Chemical Vapor Deposition in the B-N-H-He System, Neorg. Mater., 1998, vol. 34, no. 2, pp. 184-188 [Inorg. Mater. (Engl. Transl.), vol. 34, no. 2, pp. 132-136].
-
Inorg. Mater. (Engl. Transl.)
, vol.34
, Issue.2
, pp. 132-136
-
-
-
20
-
-
0031547421
-
A Thermodynamic Approach to Chemical Vapor Deposition of Boron Nitride Thin Films from Borazine
-
Kuznetsov, F.A., Golubenko, A.N., and Kosinova, M.L., A Thermodynamic Approach to Chemical Vapor Deposition of Boron Nitride Thin Films from Borazine, Appl. Surf. Sci., 1997, vol. 113/114, no. 1/2, pp. 638-641.
-
(1997)
Appl. Surf. Sci.
, vol.113-114
, Issue.1-2
, pp. 638-641
-
-
Kuznetsov, F.A.1
Golubenko, A.N.2
Kosinova, M.L.3
-
21
-
-
2542571362
-
x:H Dielectric Layers Prepared by Field-Assisted Plasma-Enhanced Chemical Vapor Deposition
-
x:H Dielectric Layers Prepared by Field-Assisted Plasma-Enhanced Chemical Vapor Deposition, Neorg. Mater., 1995, vol. 31, no. 12, pp. 1541-1544 [Inorg. Mater. (Engl. Transl.), vol. 31, no. 12, pp. 1400-1403].
-
(1995)
Neorg. Mater.
, vol.31
, Issue.12
, pp. 1541-1544
-
-
Sal'man, E.G.1
Kosinova, M.L.2
Korshunov, A.N.3
-
22
-
-
9644299941
-
-
x:H Dielectric Layers Prepared by Field-Assisted Plasma-Enhanced Chemical Vapor Deposition, Neorg. Mater., 1995, vol. 31, no. 12, pp. 1541-1544 [Inorg. Mater. (Engl. Transl.), vol. 31, no. 12, pp. 1400-1403].
-
Inorg. Mater. (Engl. Transl.)
, vol.31
, Issue.12
, pp. 1400-1403
-
-
-
23
-
-
0003767131
-
RPECVD Boron Nitride Layers from Borazine as Single-Source Precursor
-
Paris
-
Kosinova, M.L., Rumyantsev, Yu.M., Fainer, N.I., and Kuznetsov, F.A., RPECVD Boron Nitride Layers from Borazine as Single-Source Precursor, Proc. XIV Int. Conf. on Chemical Vapor Deposition and EUROCVD-11, Paris, 1997, pp. 441-446.
-
(1997)
Proc. XIV Int. Conf. on Chemical Vapor Deposition and EUROCVD-11
, pp. 441-446
-
-
Kosinova, M.L.1
Rumyantsev, Yu.M.2
Fainer, N.I.3
Kuznetsov, F.A.4
-
24
-
-
9644265696
-
On Thermodynamic Modeling of Boron Nitride Deposition in B-N-H-Cl-He System with Oxygen Traces
-
Irkutsk
-
Titov, V.A., Kosinova, M.L., Golubenko, A.N., and Kuznetsov, F.A., On Thermodynamic Modeling of Boron Nitride Deposition in B-N-H-Cl-He System with Oxygen Traces, III M. V. Mokhosoev Memorial Int. Seminar on New Materials, Irkutsk, 1996, p. 94.
-
(1996)
III M. V. Mokhosoev Memorial Int. Seminar on New Materials
, pp. 94
-
-
Titov, V.A.1
Kosinova, M.L.2
Golubenko, A.N.3
Kuznetsov, F.A.4
-
25
-
-
0003935142
-
Data Bank of Properties of Microelectronic Materials
-
Japan
-
Kuznetsov, F.A., Titov, V.A., Titov, A.A., et al., Data Bank of Properties of Microelectronic Materials, Proc. Int. Symp. on Advanced Materials, Japan, 1995, pp. 16-32.
-
(1995)
Proc. Int. Symp. on Advanced Materials
, pp. 16-32
-
-
Kuznetsov, F.A.1
Titov, V.A.2
Titov, A.A.3
-
26
-
-
9644310581
-
-
Moscow: Nauka
-
Termodinamicheskie svoistva individual'nykh veshchestv (Thermodynamic Properties of Individual Substances), Glushko, V.P. et al., Eds., Moscow: Nauka, 1988, vol. 3, issue 2.
-
(1988)
Termodinamicheskie Svoistva Individual'nykh Veshchestv (Thermodynamic Properties of Individual Substances)
, vol.3
, Issue.2
-
-
Glushko, V.P.1
-
27
-
-
0024068491
-
Properties of BN Thin Films Deposited by Plasma CVD
-
Chayahara, A., Yokoyama, H., Imura, T., and Osaka, Yu., Properties of BN Thin Films Deposited by Plasma CVD, Appl. Surf. Sci., 1988, vol. 33/34, no. 1/2, pp. 561-566.
-
(1988)
Appl. Surf. Sci.
, vol.33-34
, Issue.1-2
, pp. 561-566
-
-
Chayahara, A.1
Yokoyama, H.2
Imura, T.3
Osaka, Yu.4
-
28
-
-
0001345836
-
Effects of the Substrate Bias on the Formation of Cubic Boron Nitride by Inductively-Coupled Plasma Enhanced Chemical Vapor Deposition
-
Ichiki, T., Momose, T., and Yoshida, T., Effects of the Substrate Bias on the Formation of Cubic Boron Nitride by Inductively-Coupled Plasma Enhanced Chemical Vapor Deposition, J. Appl. Phys., 1994, vol. 75, no. 3, pp. 1330-1333.
-
(1994)
J. Appl. Phys.
, vol.75
, Issue.3
, pp. 1330-1333
-
-
Ichiki, T.1
Momose, T.2
Yoshida, T.3
-
29
-
-
0033362545
-
Cubic Boron Nitride Thin Film Synthesis on Silica Substrates by Low-Pressure Inductively-Coupled r.f. Plasma Chemical Vapor Deposition
-
Chattopadhyay, K.K., Matsumoto, S., Zhang, Y.-F., et al., Cubic Boron Nitride Thin Film Synthesis on Silica Substrates by Low-Pressure Inductively-Coupled r.f. Plasma Chemical Vapor Deposition, Thin Solid Films, 1999, vol. 354, no. 1/2, pp. 24-28.
-
(1999)
Thin Solid Films
, vol.354
, Issue.1-2
, pp. 24-28
-
-
Chattopadhyay, K.K.1
Matsumoto, S.2
Zhang, Y.-F.3
-
30
-
-
0026930713
-
Formation and Properties of Cubic Boron Nitride Films on Tungsten Carbide by Plasma Chemical Vapor Deposition
-
Okamoato, M., Utsumi, Yo., and Osaka, Yu., Formation and Properties of Cubic Boron Nitride Films on Tungsten Carbide by Plasma Chemical Vapor Deposition, Jpn. J. Appl. Phys., Part 1, 1992, vol. 31, no. 10, pp. 3455-3460.
-
(1992)
Jpn. J. Appl. Phys., Part 1
, vol.31
, Issue.10
, pp. 3455-3460
-
-
Okamoato, M.1
Utsumi, Yo.2
Osaka, Yu.3
-
31
-
-
0029485320
-
Comparison of the Properties of BN Films Synthesized by Inductively Coupled r.f. and Microwave Plasmas
-
Kiel, F., Cotarelo, M., Delplancke, M.P., and Winand, R., Comparison of the Properties of BN Films Synthesized by Inductively Coupled r.f. and Microwave Plasmas, Thin Solid Films, 1995, vol. 270, no. 1/2, pp. 118-123.
-
(1995)
Thin Solid Films
, vol.270
, Issue.1-2
, pp. 118-123
-
-
Kiel, F.1
Cotarelo, M.2
Delplancke, M.P.3
Winand, R.4
-
32
-
-
0000843314
-
Electron Emission Characteristics of Boron Nitride Films Synthesized by Plasma-Assisted Chemical Vapor Deposition
-
Sugino, T., Kawasaki, S., Tanioka, K., and Shirafuji, Ju., Electron Emission Characteristics of Boron Nitride Films Synthesized by Plasma-Assisted Chemical Vapor Deposition, J. Vac. Sci. Technol., B, 1998, vol. 16, no. 3, pp. 1211-1214.
-
(1998)
J. Vac. Sci. Technol., B
, vol.16
, Issue.3
, pp. 1211-1214
-
-
Sugino, T.1
Kawasaki, S.2
Tanioka, K.3
Shirafuji, Ju.4
-
33
-
-
0031996235
-
Electron Emission from Nanocrystalline Boron Nitride Films Synthesized by Plasma-Assisted Chemical Vapor Deposition
-
Sugino, T., Tanioka, K., Kawasaki, S., and Shirafuji, Ju, Electron Emission from Nanocrystalline Boron Nitride Films Synthesized by Plasma-Assisted Chemical Vapor Deposition, Diamond Relat. Mater., 1998, vol. 7, nos. 2-5, pp. 632-635.
-
(1998)
Diamond Relat. Mater.
, vol.7
, Issue.2-5
, pp. 632-635
-
-
Sugino, T.1
Tanioka, K.2
Kawasaki, S.3
Shirafuji, Ju.4
-
34
-
-
84953679203
-
Composition and Structure of Boron Nitride Films Deposited by Chemical Vapor Deposition from Borazine
-
Kouvetakis, J., Patel, V.V., Miller, C.W., and Beach, D.B., Composition and Structure of Boron Nitride Films Deposited by Chemical Vapor Deposition from Borazine, J. Vac. Sci. Technol., A, 1990, vol. 8, no. 6, pp. 3929-3933.
-
(1990)
J. Vac. Sci. Technol., A
, vol.8
, Issue.6
, pp. 3929-3933
-
-
Kouvetakis, J.1
Patel, V.V.2
Miller, C.W.3
Beach, D.B.4
-
35
-
-
0003029029
-
Hot Filament Activated Chemical Vapor Deposition of Boron Nitride
-
Rye, R.R., Hot Filament Activated Chemical Vapor Deposition of Boron Nitride, J. Vac. Sci. Technol., A, 1991, vol. 9, no. 3, pp. 1099-1103.
-
(1991)
J. Vac. Sci. Technol., A
, vol.9
, Issue.3
, pp. 1099-1103
-
-
Rye, R.R.1
-
36
-
-
43949164293
-
Boron Nitride Thin Films by Microwave ECR Plasma Chemical Vapor Deposition
-
Paisley, M.J., Bourget, L.P., and Davis, R.F., Boron Nitride Thin Films by Microwave ECR Plasma Chemical Vapor Deposition, Thin Solid Films, 1993, vol. 235, no. 1/2, pp. 30-34.
-
(1993)
Thin Solid Films
, vol.235
, Issue.1-2
, pp. 30-34
-
-
Paisley, M.J.1
Bourget, L.P.2
Davis, R.F.3
-
37
-
-
84957232547
-
Boron Nitride Thin Film Deposition Using Electron Cyclotron Resonance Microwave Plasmas
-
Gorbatkin, S.M., Burgie, R.F., Oliver, W.Q., et al., Boron Nitride Thin Film Deposition Using Electron Cyclotron Resonance Microwave Plasmas, J. Vac. Sci. Technol., A, 1993, vol. 11, no. 4, pp. 1863-1869.
-
(1993)
J. Vac. Sci. Technol., A
, vol.11
, Issue.4
, pp. 1863-1869
-
-
Gorbatkin, S.M.1
Burgie, R.F.2
Oliver, W.Q.3
-
38
-
-
3442894835
-
Chemical Vapor Deposition of Boron Nitride Films Activated by UV KrF Excimer Laser Pulses
-
Moscow
-
Ugarov, M.V., Ageev, V.P., and Konov, V.I., Chemical Vapor Deposition of Boron Nitride Films Activated by UV KrF Excimer Laser Pulses, Kvantovaya Elektron. (Moscow), 1995, vol. 22, no. 7, pp. 706-710.
-
(1995)
Kvantovaya Elektron.
, vol.22
, Issue.7
, pp. 706-710
-
-
Ugarov, M.V.1
Ageev, V.P.2
Konov, V.I.3
-
39
-
-
0030408643
-
Synthesis of Cubic Boron Nitride Films Using a Helicon Wave Plasma and Reduction of Compressive Stress
-
Kim, I.-H., Kim, K.-S., Kim, S.-H., and Lee, S.-R., Synthesis of Cubic Boron Nitride Films Using a Helicon Wave Plasma and Reduction of Compressive Stress, Thin Solid Films, 1996, vol. 290/291, no. 1, pp. 120-125.
-
(1996)
Thin Solid Films
, vol.290-291
, Issue.1
, pp. 120-125
-
-
Kim, I.-H.1
Kim, K.-S.2
Kim, S.-H.3
Lee, S.-R.4
-
40
-
-
0033328341
-
The Parameters of Equilibrium between Oxygen Solid Solutions in Cubic and Graphite-like Hexagonal Boron Nitrides
-
Turkevich, V.Z., The Parameters of Equilibrium between Oxygen Solid Solutions in Cubic and Graphite-like Hexagonal Boron Nitrides, Diamond Relat. Mater., 1999, vol. 8, no. 11, pp. 2032-2035.
-
(1999)
Diamond Relat. Mater.
, vol.8
, Issue.11
, pp. 2032-2035
-
-
Turkevich, V.Z.1
-
41
-
-
0001122859
-
Investigation of the c-BN/h-BN Phase Transformation at Normal Pressure
-
Sachdev, H., Haubner, R., Nöth, H., and Lux, B., Investigation of the c-BN/h-BN Phase Transformation at Normal Pressure, Diamond Relat. Mater., 1997, vol. 6, nos. 2-4, pp. 286-292.
-
(1997)
Diamond Relat. Mater.
, vol.6
, Issue.2-4
, pp. 286-292
-
-
Sachdev, H.1
Haubner, R.2
Nöth, H.3
Lux, B.4
|