Revolutionary and evolutionary resist design concepts for 193 nm lithography

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 133-136

  Nalamasu, O ^a   Wallow, T I ^a   Reichmanis, E ^a   Novembre, A E ^a   Houlihan, F M ^a   Dabbagh, G ^a   Mixon, D A ^a   Hutton, R S ^a   Timko, A G ^a   Wood, O R ^a   Cirelli, R A ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; PHOTOLITHOGRAPHY; SEMICONDUCTING POLYMERS; TERPOLYMERS;

DISSOLUTION INHIBITOR; PHOTOACID GENERATOR; PLASMA POLYMERIZED METHYL SILANE;

PHOTORESISTS;

EID: 0031072686     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00172-4     Document Type: Article

References (10)

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2. E. Reichmanis, O. Nalamasu, A.E. Novembre, J. Photopolym. Sci. and Technol., 4, 709 (1995).
3. R.A. Allen, G.M. Wallraff, R.A. Di Pietro, D.C. Hofer, R.R. Kunz, Proc. SPIE, 2438, 474 (1995).
4. T.I. Wallow, F.M. Houlihan, O. Nalamasu, E.A. Chandross, T.X. Neenan, E. Reichmanis, Proc. SPIE, 2724, 355 (1996).
5. H. Gokan, S. Esho, Y. Ohnishi, J. Electrochem. Soc., 130, 143 (1993).
6. R.R. Kunz, S.C. Palmateer, A.R. Forte, R.D. Allen, G.M. Wallraff, R.A. Di Pietro, D.C. Hofer, Proc. SPIE, 2724, 365 (1996).
7. A manuscript detailing the detailed structure-property relationships involving the matrix polymer and DI is in preparation.
8. B.W. Smith, D.A. Mixon, A.E. Novembre, S. Butt, Proc. SPIE, 2438, 504 (1995).
9. T.W. Weidman, O. Joubert, A.M. Joshi, J.T_C. Lee, D. Boulin, E.A. Chandross, R. Cirelli, F.P. Klemens, H.L. Maynard, V.M. Donnelly, J. Photopolym. Sci. and Technol. 4, 679 (1995).
10. R.L. Kostelak, T.W. Weidman, S. Vaidya, O. Joubert, S.C. Palmateer, M. Hibbs, J.Vac.Sci. Technol. B, B13(6), 2994, 1995.