Precise patterning of Si O2 -based glass by low-temperature nanoimprint lithography assisted by UV irradiation on both faces using Glasia as a precursor

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 4, 2007, Pages 1393-1397

  Okinaka, Motoki ^a   Tsushima, Hiroshi ^b   Ichinose, Yoshifumi ^b   Watanabe, Emi ^b   Yanagisawa, Keiichi ^a   Tsukagoshi, Kazuhito ^a   Aoyagi, Yoshinobu ^a,c  

^a RIKEN   (Japan)

^b Nippon Paint Co Ltd ^*  (Japan)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

NANOIMPRINT LITHOGRAPHY; POLYSILANES; SILICA; ULTRAVIOLET RADIATION;

GLASIA; PATTERNED STRUCTURE; RAPID PATTERNING; ULTRASONICATION;

GLASS;

GLASS; LITHOGRAPHY; SILICA;

EID: 34547574686     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2759936     Document Type: Article

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