Physical properties of low-k films based on the co-condensation of methyltrimethoxysilane with a bridged silsesquioxane

Journal of Materials Science

Volumn 42, Issue 12, 2007, Pages 4591-4602

  Kim, B R ^a   Kang, J W ^a   Lee, K Y ^a   Son, J M ^a   Ko, M J ^a  

^a LG Chemical Ltd   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CONDENSATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FRACTURE TOUGHNESS; MONOMERS; NANOINDENTATION; NUCLEAR MAGNETIC RESONANCE; PERMITTIVITY; STRENGTH OF MATERIALS;

BRIDGED SILSESQUIOXANE; METHYLTRIMETHOXYSILANE; MTMS (METHYLTRIMETHOXYSILANE); SUCCESSFUL INTEGRATION;

COPOLYMERS;

EID: 34547325238     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-006-0575-9     Document Type: Article

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