Structure and optical properties of dc reactive magnetron sputtered zinc oxide films

Crystal Research and Technology

Volumn 34, Issue 8, 1999, Pages 981-988

  Subramanyam, T K ^a   Naidu, B Srinivasulu ^a   Uthanna, S ^a  

^a SRI VENKATESWARA UNIVERSITY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; ENERGY GAP; FILM GROWTH; GLASS; MAGNETRON SPUTTERING; PRESSURE EFFECTS; SEMICONDUCTING ZINC COMPOUNDS; SPUTTER DEPOSITION; THERMAL EFFECTS; THIN FILMS; TRANSPARENCY; ZINC OXIDE;

REACTIVE MAGNETRON SPUTTERING;

SEMICONDUCTING FILMS;

EID: 0032594459     PISSN: 02321300     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-4079(199909)34:8<981::AID-CRAT981>3.0.CO;2-G     Document Type: Article

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