A simple method for measurement of photoacid generator photoreaction kinetics in formulated, chemically amplified photoresist films

Electrochemical and Solid-State Letters

Volumn 10, Issue 9, 2007, Pages 273-277

  Lee, Cheng Tsung ^a   Yueh, Wang ^b   Roberts, Jeanette ^b   Henderson, Clifford L ^a,c  

^a Georgia Institute of Technology   (United States)

^b INTEL CORPORATION   (United States)

^c ELECTROCHEMICAL SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICALLY AMPLIFIED PHOTORESIST FILMS; PHOTOACID GENERATOR (PAG); PHOTOACID GENERATOR PHOTOREACTION KINETICS; REACTIVE POLYMER MATRIXES;

NONDESTRUCTIVE EXAMINATION; NUMERICAL METHODS; PHOTOREACTIVITY; THIN FILMS;

PHOTORESISTORS;

EID: 34547157504     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2751835     Document Type: Article

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