Effect of film composition on the performance of interdigitated electrode methods used for chemically amplified photoresist characterization: Methods for analyzing photoresist materials containing base quencher

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue II, 2005, Pages 1076-1087

  Berger, Cody ^a   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

Author keywords

Base quencher; Chemically amplified resist; Dill C; Interdigitated electrode; Photoacid generator

Indexed keywords

BASE QUENCHER; CHEMICALLY AMPLIFIED RESIST; DILL C; FILM COMPOSITION; PHOTOACID GENERATOR (PAG);

CONCENTRATION (PROCESS); ELECTROCHEMICAL ELECTRODES; POLYMERS; QUENCHING; RATE CONSTANTS; SENSORS; THIN FILMS;

COATING TECHNIQUES;

EID: 24644467649     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.607437     Document Type: Conference Paper

References (6)

1. Berger, Cody M.; Henderson, Clifford L. "Improved method for measuring photoacid generator kinetics in polymer thin films using normalized interdigitated electrode capacitance data." Journal of Vacuum Science & Technology, B: Microelectronics and Nanometer Structures-Processing, Measurement, and Phenomena, 22(3), pp. 1163-1173, (2004).
2. Berger, Cody M.; Byers, Jeffrey D.; Henderson, Clifford L. "Using Interdigitated Electrodes for Measuring Photoacid Generator Kinetics in Chemically Amplified Resists," Journal of the Electrochemical Society, 151(2), pp. G119-G130, (2004).
3. Pawloski, Adam R.; Nealey, Paul F. "Useful protocol for evaluating subtle and important differences between photoresist formulations," Journal of Vacuum Science & Technology, B: Microelectronics and Nanometer Structures-Processing, Measurement, and Phenomena, 22(3), 869-874, (2004).
4. Pawloski, Adam R.; Nealey, Paul F. "Effect of photoacid generator concentration on sensitivity, photoacid generation, and deprotection of chemically amplified resists," Journal of Vacuum Science & Technology, B: Microelectronics and Nanometer Structures, 20(6), 2413-2420, (2002).
5. Pawloski, Adam R.; Christian; Nealey, Paul F. "Micromolar concentrations of base quenchers impact the apparent efficiency of photoacid generation in chemically amplified resists," Journal of Vacuum Science & Technology, B: Microelectronics and Nanometer Structures, 20(5), 2162-2168, (2002).
6. Pawloski, Adam R.; Christian; Nealey, Paul F. "A Standard Addition Technique To Quantify Photoacid Generation in Chemically Amplified Photoresist," Chemistry of Materials, 13(11), 4154-4162, (2001).