The effects of annealing temperature on the properties of Bi3.15Nd0.85Ti3O12 thin films

Scripta Materialia

Volumn 57, Issue 8, 2007, Pages 675-678

  Zheng, X J ^a   Yi, W M ^a   Chen, Y Q ^a   Wu, Q Y ^a   He, L ^a  

^a XIANGTAN UNIVERSITY   (China)

Author keywords

BNT thin film; Ferroelectricity; Metal organic decomposition (MOD); Residual stress; X ray diffraction

Indexed keywords

ANNEALING; BISMUTH COMPOUNDS; FERROELECTRICITY; MICROSTRUCTURE; RESIDUAL STRESSES; TENSILE STRESS; X RAY DIFFRACTION;

BNT THIN FILM; FERROELECTRIC DEGRADATION; METAL-ORGANIC DECOMPOSITION; REMNANT POLARIZATION;

THIN FILMS;

EID: 34547112019     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2007.06.045     Document Type: Article

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