Abnormal crystallization of silicon thin films deposited by ICP-CVD

Chinese Physics Letters

Volumn 22, Issue 12, 2005, Pages 3130-3132

  Li, Jun Shuai ^a   Yin, Min ^a   Wang, Jin Xiao ^a   He, De Yan ^a  

^a LANZHOU UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

INDUCTIVELY COUPLED PLASMA; SILICON; SILICON COMPOUNDS; THIN FILMS; X RAY DIFFRACTION;

CRISTALLINITY; EXPERIMENTAL CONDITIONS; INDUCTIVELY COUPLED PLASMA CHEMICAL VAPOR DEPOSITION; LOW ELECTRON TEMPERATURE; LOWS-TEMPERATURES; ORIENTATION CHANGES; PREFERRED ORIENTATIONS; SI-FILMS; SILICON THIN FILM; SPATIAL CONFINEMENT;

TEMPERATURE;

EID: 28744440741     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/22/12/041     Document Type: Article

References (18)

1. Shah A, Torres P, Tscharner R et al 1999 Science 285 692
2. Bergmann R B 1999 Appl. Phys. A 69 187
3. Yamamoto K, Yoshimi M, Tawada Y et al 1999 Appl. Phys. A 69 179
4. Won S H, Youn J H, Jang J et al 2001 J. Korean. Phys. Soc. 39 123
5. Kato T 1988 IEEE Trans. Electron. Devices 35 923
6. Inversion R B, Rief R 1987 J. Appl. Phys. 62 1675
7. Sameshima T, Hara M and Usui S 1989 Jpn. J. Appl. Phys. 28 1789
8. Schaber H, Cutter D, Binder J et al 1993 J. Appl. Phys. 54 4633
9. Rath J K 2003 Solar Energy Mater. Sol. Cells 76 431
10. He D Y, Wang X Q, Chen Q et al 2005 J. Korean Phys. Soc. 46 S88
11. He D Y 2001 Acta Phys. Sin. 50 779 (in Chinese)
12. Schropp R E I, Stannowski B, Brockhoff A M et al 2000 Mater. Phys. Mech. 1 73
13. Rath J K, Schropp R E I and Beyer W 2001 Solid State Phenom. 80-81 311
14. Moon B Y, Youn J H, Won S H et al 2001 Solar Energy Mater. Sol. Cells 69 139
15. Perrin J and Broekhuizen T 1987 Appl. Phys. Lett. 50 433
16. Tanaka T, Hiramatsu M, Nawata M et al 1994 J. Phys. D 27 1660
17. Nomura H, Akimoto K, Kono A et al 1995 J. Phys. D 28 1977
18. Shimizu S, Kondo M and Matsuda A 2005 J. Appl. Phys. 97 033522-1