-
3
-
-
0026907669
-
-
J. M. DeSimone, Z. Guan, C. S. Elsbernd, Science 1992, 257, 945.
-
(1992)
Science
, vol.257
, pp. 945
-
-
DeSimone, J.M.1
Guan, Z.2
Elsbernd, C.S.3
-
6
-
-
0033599560
-
-
M. Ji, X. Chen, C. M. Wei, J. L. Fulton, J. Am. Chem. Soc. 1999, 121, 2631.
-
(1999)
J. Am. Chem. Soc
, vol.121
, pp. 2631
-
-
Ji, M.1
Chen, X.2
Wei, C.M.3
Fulton, J.L.4
-
7
-
-
33645348408
-
-
P. S. Shah, K. P. Johnston, B. A. Korgel, J. Phys. Chem. B. 2004, 108, 9754.
-
(2004)
J. Phys. Chem. B
, vol.108
, pp. 9754
-
-
Shah, P.S.1
Johnston, K.P.2
Korgel, B.A.3
-
11
-
-
1542736044
-
-
J. C. J. V. D. Donck, A. So, G. Frens, Tenside, Surfactants, Detergents. 1998, 35, 119.
-
(1998)
Tenside, Surfactants, Detergents
, vol.35
, pp. 119
-
-
Donck, J.C.J.V.D.1
So, A.2
Frens, G.3
-
15
-
-
0037898111
-
-
A. Batra, S. Paria, C. Manohar, K. C. Khilar, AIChE J. 2001, 47, 2557.
-
(2001)
AIChE J
, vol.47
, pp. 2557
-
-
Batra, A.1
Paria, S.2
Manohar, C.3
Khilar, K.C.4
-
17
-
-
0031175941
-
-
D. J. M. Bergink-Martens, G. Frens, Tenside, Surfactants, Deterg. 1997, 34, 263.
-
(1997)
Tenside, Surfactants, Deterg
, vol.34
, pp. 263
-
-
Bergink-Martens, D.J.M.1
Frens, G.2
-
21
-
-
34447306121
-
-
http://www.micell.com/
-
-
-
-
22
-
-
0023293131
-
-
B. O. Brady, C. Kao, K. M. Dooley; C. F. Knopf, Ind. Eng. Chem. Res. 1987, 26, 261.
-
(1987)
Ind. Eng. Chem. Res
, vol.26
, pp. 261
-
-
Brady, B.O.1
Kao, C.2
Dooley, K.M.3
Knopf, C.F.4
-
23
-
-
0023432646
-
-
K. M. Dooley, C. Kao, R. P. Gambrell, C. F. Knopf, Ind. Eng. Chem. Res. 1987, 26, 2058.
-
(1987)
Ind. Eng. Chem. Res
, vol.26
, pp. 2058
-
-
Dooley, K.M.1
Kao, C.2
Gambrell, R.P.3
Knopf, C.F.4
-
24
-
-
0034306467
-
-
F. Trabelsi, F. Stuber, K. Abaroudi, M. A. Larrayoz, F. Recasens, J. E. Sueiras, Ind. Eng. Chem. Res. 2000, 39, 3666.
-
(2000)
Ind. Eng. Chem. Res
, vol.39
, pp. 3666
-
-
Trabelsi, F.1
Stuber, F.2
Abaroudi, K.3
Larrayoz, M.A.4
Recasens, F.5
Sueiras, J.E.6
-
25
-
-
3142512943
-
-
P. G. Clark, B. D. Schwab, J. W. Butternaugh, H. J. Martinez, P. J. Wolf, Semicond. Int. 2003, 26, 46.
-
(2003)
Semicond. Int
, vol.26
, pp. 46
-
-
Clark, P.G.1
Schwab, B.D.2
Butternaugh, J.W.3
Martinez, H.J.4
Wolf, P.J.5
-
26
-
-
34447318444
-
-
International Sematech, Austin, TX, USA
-
G. B. Jacobson, B. Palmer, R. Brown, D. Dreissig, D. Yellowaga, M. Biberger, Wafer Clean and Surface Prep Workshop, International Sematech, Austin, TX, USA 2003.
-
(2003)
Wafer Clean and Surface Prep Workshop
-
-
Jacobson, G.B.1
Palmer, B.2
Brown, R.3
Dreissig, D.4
Yellowaga, D.5
Biberger, M.6
-
27
-
-
0242416946
-
-
C. A. Bessel, G. M. Denison, J. M. DeSimone, J. DeYoung, S. Gross, C. K. Schauer, P. M. Visintin, J. Am. Chem. Soc. 2003, 125, 4980.
-
(2003)
J. Am. Chem. Soc
, vol.125
, pp. 4980
-
-
Bessel, C.A.1
Denison, G.M.2
DeSimone, J.M.3
DeYoung, J.4
Gross, S.5
Schauer, C.K.6
Visintin, P.M.7
-
28
-
-
33750344523
-
-
P. M. Visintin, G. M. Denison, S. A. Crette, C. K. Schauer, J. M. DeSimone, Polym. Mater. Sci. Eng. 2002, 87, 205.
-
(2002)
Polym. Mater. Sci. Eng
, vol.87
, pp. 205
-
-
Visintin, P.M.1
Denison, G.M.2
Crette, S.A.3
Schauer, C.K.4
DeSimone, J.M.5
-
29
-
-
4344658421
-
-
G. M. Denison, C. Jones, J. DeYoung, S. Gross, J. McClain, L. Zannoni, E. Hicks, C. Wood, M. K. Boggiano, P. Visintin, C. Bessel, C. Schauer, J. M. DeSimone, Polym. Mater. Sci. Eng. 2004, 90, 152.
-
(2004)
Polym. Mater. Sci. Eng
, vol.90
, pp. 152
-
-
Denison, G.M.1
Jones, C.2
DeYoung, J.3
Gross, S.4
McClain, J.5
Zannoni, L.6
Hicks, E.7
Wood, C.8
Boggiano, M.K.9
Visintin, P.10
Bessel, C.11
Schauer, C.12
DeSimone, J.M.13
-
30
-
-
34447297631
-
-
International Technology Roadmap for Semiconductors
-
International Technology Roadmap for Semiconductors, 2001.
-
(2001)
-
-
-
31
-
-
34447332608
-
-
International Technology Roadmap for Semiconductors
-
International Technology Roadmap for Semiconductors, 2003.
-
(2003)
-
-
-
32
-
-
0036776631
-
-
K. Mosig, T. Jacobs, K. Brennan, M. Rasco, J. Wolf, R. Augur, Microelectronic Eng. 2002, 64, 11.
-
(2002)
Microelectronic Eng
, vol.64
, pp. 11
-
-
Mosig, K.1
Jacobs, T.2
Brennan, K.3
Rasco, M.4
Wolf, J.5
Augur, R.6
-
33
-
-
0035367406
-
-
S. Loper, W. P. C. Ma, L. Chang, K. Lee, D. Peter-Kini, Solid State Technol. 2001, 44, 68.
-
(2001)
Solid State Technol
, vol.44
, pp. 68
-
-
Loper, S.1
Ma, W.P.C.2
Chang, L.3
Lee, K.4
Peter-Kini, D.5
-
34
-
-
0142106901
-
-
M. Fayolle, G. Passemard, O. Louuveau, F. Fusalba, J. Cluzel, Microclectron. Eng. 2003, 70, 255.
-
(2003)
Microclectron. Eng
, vol.70
, pp. 255
-
-
Fayolle, M.1
Passemard, G.2
Louuveau, O.3
Fusalba, F.4
Cluzel, J.5
-
35
-
-
12844287793
-
-
D. Louis, E. Lajoinie, F. Pires, W. M. Lee, D. Holmes, Microelectron. Eng. 1998, 41/42, 415.
-
(1998)
Microelectron. Eng
, vol.41-42
, pp. 415
-
-
Louis, D.1
Lajoinie, E.2
Pires, F.3
Lee, W.M.4
Holmes, D.5
-
40
-
-
3142512943
-
Cleaning and restoring k value of porous MSQ films
-
P. G. Clark, B. D. Schwab, J. W. Butternaugh, H. J. Martinez, P. J. Wolf, Cleaning and restoring k value of porous MSQ films, Semicond. Int. 2003, 26, 46-48, 50, 52.
-
(2003)
Semicond. Int
, vol.26
-
-
Clark, P.G.1
Schwab, B.D.2
Butternaugh, J.W.3
Martinez, H.J.4
Wolf, P.J.5
-
41
-
-
0001290449
-
-
K. E. Laintz, C. M. Wai, R. C. Yonker, R. D. Smith, J. Supercrit. Fluids 1991, 4, 194.
-
(1991)
J. Supercrit. Fluids
, vol.4
, pp. 194
-
-
Laintz, K.E.1
Wai, C.M.2
Yonker, R.C.3
Smith, R.D.4
-
43
-
-
18144374516
-
-
B. Xie, C. C. Finstad, A. J. Muscat, Chem. Mater. 2005, 17, 1753.
-
(2005)
Chem. Mater
, vol.17
, pp. 1753
-
-
Xie, B.1
Finstad, C.C.2
Muscat, A.J.3
-
44
-
-
0037176945
-
-
S. M. Sirard, K. J. Ziegler, I. C. Sanchez, P. F. Green, K. P. Johnston, Macromolecules 2002, 35, 1928.
-
(2002)
Macromolecules
, vol.35
, pp. 1928
-
-
Sirard, S.M.1
Ziegler, K.J.2
Sanchez, I.C.3
Green, P.F.4
Johnston, K.P.5
-
45
-
-
33846861302
-
-
X. Zhang, J. Q Pham, H. J. Martinez, J. Walf, P. F. Green, K. P. Johnston, J. Vac. Sci. Technol. B. 2003, 21, 2569.
-
(2003)
J. Vac. Sci. Technol. B
, vol.21
, pp. 2569
-
-
Zhang, X.1
Pham, J.Q.2
Martinez, H.J.3
Walf, J.4
Green, P.F.5
Johnston, K.P.6
-
46
-
-
0034817707
-
-
S. M. Sirard, P. F. Green, K. P. Johnston, J. Phys. Chem. 2001, 105, 766.
-
(2001)
J. Phys. Chem
, vol.105
, pp. 766
-
-
Sirard, S.M.1
Green, P.F.2
Johnston, K.P.3
-
47
-
-
2342650138
-
-
X. Zhang, J. Q Pham, N. Ryza, P. T. Green, K. P. Johnston, J. Vac. Sci. Technol. B. 2004, 22, 818.
-
(2004)
J. Vac. Sci. Technol. B
, vol.22
, pp. 818
-
-
Zhang, X.1
Pham, J.Q.2
Ryza, N.3
Green, P.T.4
Johnston, K.P.5
-
49
-
-
0034650080
-
-
L. Calvo, J. D. Holmes, M. Z. Yetes, K. P. Johnston, J. Supercrit. Fluids. 2000, 16, 247.
-
(2000)
J. Supercrit. Fluids
, vol.16
, pp. 247
-
-
Calvo, L.1
Holmes, J.D.2
Yetes, M.Z.3
Johnston, K.P.4
-
50
-
-
0035856653
-
-
K. P. Johnston, D. Cho, S. R. P. DaRocha, P. A. Psathas, W. Ryoo, S. E. Webber, J. Eastoe, A. Dupont, D. C. Steytler, Langmuir 2001, 17, 7191.
-
(2001)
Langmuir
, vol.17
, pp. 7191
-
-
Johnston, K.P.1
Cho, D.2
DaRocha, S.R.P.3
Psathas, P.A.4
Ryoo, W.5
Webber, S.E.6
Eastoe, J.7
Dupont, A.8
Steytler, D.C.9
-
51
-
-
0001561769
-
-
K. P. Johnston, K. L. Harrison, M. J. Clarke, S. M. Howdle, M. P. Heitz, F. V. Bright, C. Carlier, T. W. Randolph, Science 1996, 271, 624.
-
(1996)
Science
, vol.271
, pp. 624
-
-
Johnston, K.P.1
Harrison, K.L.2
Clarke, M.J.3
Howdle, S.M.4
Heitz, M.P.5
Bright, F.V.6
Carlier, C.7
Randolph, T.W.8
-
52
-
-
0345167974
-
-
W. Ryoo, S. E. Webber, K. P. Johnston, Ind. Eng. Chem. Res. 2003, 42, 6348.
-
(2003)
Ind. Eng. Chem. Res
, vol.42
, pp. 6348
-
-
Ryoo, W.1
Webber, S.E.2
Johnston, K.P.3
-
53
-
-
0035951266
-
-
J. Liu, B, Han, G. Li, X. Zhangj He, Z. Liu, Langmuir 2001, 17, 8040.
-
(2001)
Langmuir
, vol.17
, pp. 8040
-
-
Liu, J.1
Han, B.2
Li, G.3
Zhangj He, X.4
Liu, Z.5
-
54
-
-
0037087634
-
-
J. Liu, B. Han, J. Zhang, G. Li, X. Zhang, J. Wang, B. Dong, Chem. Eur. J. 2002, 8, 1356.
-
(2002)
Chem. Eur. J
, vol.8
, pp. 1356
-
-
Liu, J.1
Han, B.2
Zhang, J.3
Li, G.4
Zhang, X.5
Wang, J.6
Dong, B.7
-
55
-
-
33750379932
-
-
J. Keagy, X. Zhang, K. P. Johnston, E. Busch, F. Weber, P. J. Wolf, T. Rhoad, J. Supercrit. Fluids. 2006, 39, 277.
-
(2006)
J. Supercrit. Fluids
, vol.39
, pp. 277
-
-
Keagy, J.1
Zhang, X.2
Johnston, K.P.3
Busch, E.4
Weber, F.5
Wolf, P.J.6
Rhoad, T.7
-
56
-
-
0034318269
-
-
D. L. Goldfarb, J. J. de Pablo, P. F. Nealey, J. P. Simons, W. M. Moreau, M. Angelopoulos, J. Vac. Sci. Technol. B 2000, 18, 3313.
-
(2000)
J. Vac. Sci. Technol. B
, vol.18
, pp. 3313
-
-
Goldfarb, D.L.1
de Pablo, J.J.2
Nealey, P.F.3
Simons, J.P.4
Moreau, W.M.5
Angelopoulos, M.6
-
57
-
-
34447300803
-
-
2 in dry microelectronics applications: Cleaning, drying, stripping, lithography and CMP, 226th ACS National Meeting, New York, USA, 2003, COLL-339.
-
2 in dry microelectronics applications: Cleaning, drying, stripping, lithography and CMP, 226th ACS National Meeting, New York, USA, 2003, COLL-339.
-
-
-
-
58
-
-
34447308316
-
-
US Patent Appl. Publ, Micell Technologies, Inc, USA, 2003, 44 pp
-
J. DeYoung, J. B. McClain, M. E. Cole, S. L. Worm, D. Brainard, US Patent Appl. Publ., Micell Technologies, Inc., USA, 2003, 44 pp.
-
-
-
DeYoung, J.1
McClain, J.B.2
Cole, M.E.3
Worm, S.L.4
Brainard, D.5
-
59
-
-
34447302675
-
-
US Patent Appl. Publ, Micell Technologies, Inc, USA, 2003, 6 pp
-
J. Deyoung, S. M. Gross, M. L. Wagner, J. B. McClain, US Patent Appl. Publ., Micell Technologies, Inc., USA, 2003, 6 pp.
-
-
-
Deyoung, J.1
Gross, S.M.2
Wagner, M.L.3
McClain, J.B.4
|