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Volumn 35, Issue 3, 2007, Pages 223-229

Cleaning using CO2-based solvents

Author keywords

Carbon dioxide; Cleaning; Solvents; Supercritical fluids

Indexed keywords

CARBON DIOXIDE; CATALYST REGENERATION; CLEANING; DRY CLEANING; EXTRACTION; SOIL POLLUTION; SUPERCRITICAL FLUIDS;

EID: 34447321618     PISSN: 18630650     EISSN: None     Source Type: Journal    
DOI: 10.1002/clen.200700007     Document Type: Review
Times cited : (23)

References (59)
  • 21
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    • http://www.micell.com/
  • 30
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    • International Technology Roadmap for Semiconductors
    • International Technology Roadmap for Semiconductors, 2001.
    • (2001)
  • 31
    • 34447332608 scopus 로고    scopus 로고
    • International Technology Roadmap for Semiconductors
    • International Technology Roadmap for Semiconductors, 2003.
    • (2003)
  • 57
    • 34447300803 scopus 로고    scopus 로고
    • 2 in dry microelectronics applications: Cleaning, drying, stripping, lithography and CMP, 226th ACS National Meeting, New York, USA, 2003, COLL-339.
    • 2 in dry microelectronics applications: Cleaning, drying, stripping, lithography and CMP, 226th ACS National Meeting, New York, USA, 2003, COLL-339.
  • 59
    • 34447302675 scopus 로고    scopus 로고
    • US Patent Appl. Publ, Micell Technologies, Inc, USA, 2003, 6 pp
    • J. Deyoung, S. M. Gross, M. L. Wagner, J. B. McClain, US Patent Appl. Publ., Micell Technologies, Inc., USA, 2003, 6 pp.
    • Deyoung, J.1    Gross, S.M.2    Wagner, M.L.3    McClain, J.B.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.