Supercritical CO2-based solvents in next generation microelectronics processing

Chinese Science Bulletin

Volumn 52, Issue 1, 2007, Pages 27-33

  Zhang, XiaoGang ^a   Johnston, Keith P ^b  

^a RENMIN UNIVERSITY OF CHINA   (China)

^b The University of Texas at Austin   (United States)

Author keywords

Low k dielectrics cleaning; Photoresist drying; Supercritical carbon dioxide

Indexed keywords

EID: 33846430074     PISSN: 10016538     EISSN: 18619541     Source Type: Journal    
DOI: 10.1007/s11434-007-0002-x     Document Type: Review

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