Fabrication and characterization of highly reproducible, high resistance nanogaps made by focused ion beam milling

Nanotechnology

Volumn 18, Issue 28, 2007, Pages

  Blom, T ^a   Welch, K ^a   Stromme M ^a   Coronel, E ^a   Leifer, K ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC SCALE ELECTRODE STRUCTURES; DIELECTROPHORESIS; ION BEAM MILLING; NANOENGINEERING;

ELECTRON BEAM LITHOGRAPHY; ELECTROPHORESIS; ION BEAMS; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY;

NANOPARTICLES;

GOLD; NANOMATERIAL; NANOPARTICLE;

ARTICLE; ELECTRIC POTENTIAL; ELECTRIC RESISTANCE; ELECTRODE; ELECTRON BEAM; ELECTROPHORESIS; NANOENGINEERING; NANOFABRICATION; NANOSENSOR; NANOTECHNOLOGY; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; STRUCTURE ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 34447282286     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/28/285301     Document Type: Article

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