Direct fabrication of nano-gap electrodes by focused ion beam etching

Thin Solid Films

Volumn 499, Issue 1-2, 2006, Pages 279-284

  Nagase, Takashi ^a   Gamo, Kenji ^a   Kubota, Tohru ^a   Mashiko, Shinro ^a  

^a NATIONAL INSTITUTE OF INFORMATION AND COMMUNICATIONS TECHNOLOGY   (Japan)

Author keywords

Focused ion beam; Maskless fabrication; Molecular electronic device; Nano gap electrode

Indexed keywords

ELECTRIC CURRENTS; ELECTRONIC EQUIPMENT; ETCHING; GOLD; ION BEAMS; METALLIC FILMS; NANOSTRUCTURED MATERIALS; SPUTTERING;

FOCUSED ION BEAM; MASKLESS FABRICATION; MOLECULAR ELECTRONIC DEVICE; NANO-GAP ELECTRODE;

ELECTRODES;

EID: 31544438557     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.031     Document Type: Conference Paper

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