Pulsed DC, Gas-Flow Hollow Cathode Discharge: A Source for Sputter-Deposition

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 2003, Pages 130-134

  Paduraru, C ^a   Belkind, A ^a   Becker, K ^a   Lopez, J ^a   Delahoy, A ^b   Guo, S Y ^b  

^a STEVENS INSTITUTE OF TECHNOLOGY   (United States)

^b Energy Photovoltaics Inc   (United States)

Author keywords

Copper; Hollow cathode; Pulsed DC; Sputtering

Indexed keywords

ELECTRIC DISCHARGES; LOW TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; PLASMA DENSITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

CATHODE DISCHARGE;

SPUTTER DEPOSITION;

EID: 0242353772     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

1. K. Ishii, J.Vac.Sci.Technol., "High-Rate Low Kinetic Gas-Flow-Sputtering," A7, 256, 1989.
2. Th. Jung, A. Westphal, "High rate deposition of alumina films by reactive gas flow sputtering," Surf.Coat.Technol 59, 171, 1993.
3. L. Bardos, H. Barankova, S. Berg, "Thin film processing by radio frequency hollow cathodes," Surf.Coat.Technol., 97, 723, 1997.
4. A. Helmlmich, T. Jung, A. Kielhorn, "CVD-processes by hollow cathode glow discharge," Surf.Coat.Technol., 98, 1541, 1998.
5. A. Belkind, H. Li, H. Clow, and F. Jansen, "Oil removal from metals by linear multi-orifice hollow cathode," Surf.Coat.Technol, 76-77, 738, 1995.
6. T. Nakano, N. Ohnuki, and S. Baba, "Pressure dependence of optical emission from DC magnetron sputtering plasma observed with spatial resolution," Vacuum, 59, 581, 2006.
7. T. Kabler, T. Jung. "A noble low cost processes for the deposition of metallic and compound thin films on plastics," Surf. Coat. Tech. 98, 1116, 1998.
8. 3," J. Vac. Sci.Technol., A 17, 1934, 1999.