Enhanced dill exposure model for thick photoresist lithography

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 490-495

  Liu, Shijie ^a   Du, Jinglei ^a   Duan, Xi ^a   Luo, Boliang ^a   Tang, Xionggui ^a   Guo, Yongkang ^a   Cui, Zheng ^a   Du, Chunlei ^b   Yao, Jun ^c  

^a SICHUAN UNIVERSITY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^c DURHAM UNIVERSITY   (United Kingdom)

Author keywords

Enhanced Dill model; Exposure parameters; MEMS; Response surface analysis; Thick photoresist lithography

Indexed keywords

COMPUTER SIMULATION; DIFFUSERS (OPTICAL); LITHOGRAPHY; MATRIX ALGEBRA; PHOTORESISTORS; REFRACTIVE INDEX; SURFACE CHEMISTRY;

ENHANCED DILL MODEL; EXPOSURE PARAMETERS; MEMS; RESPONSE SURFACE ANALYSIS; THICK PHOTORESIST LITHOGRAPHY;

ELECTROMECHANICAL DEVICES;

EID: 14944379600     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.01.014     Document Type: Conference Paper

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