A novel fabrication process of 3D microstructures by double exposure in deep x-ray lithography (D2XRL)

Journal of Micromechanics and Microengineering

Volumn 15, Issue 11, 2005, Pages 2056-2062

  Matsuzuka, Naoki ^a   Hirai, Yoshikazu ^a   Tabata, Osamu ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAYS; DISSOLUTION; FABRICATION; PROCESS CONTROL; X RAY LITHOGRAPHY;

MICRO-PROJECTION ARRAYS; MICROFABRICATION; PROCESS PARAMETERS;

MICROSTRUCTURE;

EID: 27144444688     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/15/11/009     Document Type: Article

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