Moving mask LIGA (M2LIGA) process for control of side wall inclination

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 1999, Pages 252-256

  Tabata, Osamu ^a   Terasoma, Kouichi ^a   Agawa, Norihiro ^a   Yamamoto, Kouji ^a  

^a RITSUMEIKAN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; POLYMETHYL METHACRYLATES; SUBSTRATES; X RAY LITHOGRAPHY;

MOVING MASK TECHNOLOGY;

MICROMACHINING;

EID: 0032634382     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)