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Volumn 201, Issue 18, 2007, Pages 7727-7732
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Reactive sputtering of TiOxNy coatings by the reactive gas pulsing process. Part II: The role of the duty cycle
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Author keywords
Duty cycle; Reactive gas pulsing process (RGPP); Reactive sputtering; Titanium oxynitride
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Indexed keywords
DEPOSITION;
FLOW RATE;
MAGNETRON SPUTTERING;
OPACITY;
PULSATILE FLOW;
REACTIVE SPUTTERING;
TITANIUM COMPOUNDS;
DUTY CYCLE;
REACTIVE GAS PULSING PROCESS;
REACTIVE MAGNETRON SPUTTERING;
TITANIUM OXYNITRIDE;
INORGANIC COATINGS;
DEPOSITION;
FLOW RATE;
INORGANIC COATINGS;
MAGNETRON SPUTTERING;
OPACITY;
PULSATILE FLOW;
REACTIVE SPUTTERING;
TITANIUM COMPOUNDS;
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EID: 34249047460
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2007.03.021 Document Type: Article |
Times cited : (23)
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References (30)
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