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Volumn 15, Issue 3, 1997, Pages 712-715

Reactive-sputtering of titanium oxide thin films

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001767933     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580807     Document Type: Article
Times cited : (43)

References (11)
  • 10
    • 0001874777 scopus 로고
    • edited by J. L. Vossen and W. Kern Academic, Orlando
    • J. L. Vossen and J. J. Cuomo, Thin Film Processes, edited by J. L. Vossen and W. Kern (Academic, Orlando, 1978), p. 48.
    • (1978) Thin Film Processes , pp. 48
    • Vossen, J.L.1    Cuomo, J.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.