Hydrogen induced positive charge in Hf-based dielectrics

Microelectronic Engineering

Volumn 84, Issue 9-10, 2007, Pages 2354-2357

  Zhao, C Z ^a   Zhang, J F ^a   Zahid, M B ^a   Efthymiou, E ^b   Lu, Y ^c   Hall, S ^c   Peaker, A R ^b   Groeseneken, G ^d,e   Pantisano, L ^d   Degraeve, R ^d   De Gendt, S ^d,e   Heyns, M ^d  

^a LIVERPOOL JOHN MOORES UNIVERSITY   (United Kingdom)

^b UNIVERSITY OF MANCHESTER   (United Kingdom)

^c UNIVERSITY OF LIVERPOOL   (United Kingdom)

^d IMEC   (Belgium)

^e UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

Hf Silicates; HfO2; High k dielectrics; Hydrogenation; Instability; Positive charges

Indexed keywords

HF-SILICATES; HIGH-K DIELECTRICS; POSITIVE CHARGES;

HAFNIUM COMPOUNDS; HIGH TEMPERATURE EFFECTS; HYDROGENATION; NITRIDATION; POSITIVE IONS;

DIELECTRIC MATERIALS;

EID: 34248669860     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.04.096     Document Type: Article

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