Oxidation suppression in ytterbium silicidation by TiTiN bicapping layer

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 2, 2007, Pages 285-289

  Jiang, Yu Long ^a   Xie, Qi ^a   Detavernier, Christophe ^b   Van Meirhaeghe, R L ^b   Ru, Guo Ping ^a   Qu, Xin Ping ^a   Li, Bing Zong ^a   Huang, Anping ^c   Chu, Paul K ^c  

^a FUDAN UNIVERSITY   (China)

^b GHENT UNIVERSITY   (Belgium)

^c CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; ELECTRIC RESISTANCE; OXIDATION; PHYSICAL VAPOR DEPOSITION; RAPID THERMAL ANNEALING; RARE EARTH ELEMENTS; SCHOTTKY BARRIER DIODES; TITANIUM;

OXIDATION SUPPRESSION; YTTERBIUM SILICIDATION;

YTTERBIUM;

EID: 34248592929     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2464123     Document Type: Article

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