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Volumn 38, Issue 11, 1999, Pages 6226-6231

Analysis of short-channel Schottky source/drain metal-oxide-semiconductor field-effect transistor on silicon-on-insulator substrate and demonstration of sub-50-nm n-type devices with metal gate

Author keywords

[No Author keywords available]

Indexed keywords

ERBIUM COMPOUNDS; GATES (TRANSISTOR); ION IMPLANTATION; OXYGEN; SILICON ON INSULATOR TECHNOLOGY; SUBSTRATES;

EID: 0033310835     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.6226     Document Type: Article
Times cited : (92)

References (19)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.