![]() |
Volumn 38, Issue 11, 1999, Pages 6226-6231
|
Analysis of short-channel Schottky source/drain metal-oxide-semiconductor field-effect transistor on silicon-on-insulator substrate and demonstration of sub-50-nm n-type devices with metal gate
a a a a |
Author keywords
[No Author keywords available]
|
Indexed keywords
ERBIUM COMPOUNDS;
GATES (TRANSISTOR);
ION IMPLANTATION;
OXYGEN;
SILICON ON INSULATOR TECHNOLOGY;
SUBSTRATES;
ERBIUM SILICIDE;
SEPARATION BY IMPLANTED OXYGEN (SIMOX);
MOSFET DEVICES;
|
EID: 0033310835
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.38.6226 Document Type: Article |
Times cited : (93)
|
References (19)
|