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Volumn 24, Issue 2, 2003, Pages 102-104

High-performance p-channel Schottky-barrier SOI FinFET featuring self-aligned PtSi source/drain and electrical junctions

Author keywords

Ambipolar; Schottky barrier; Silicon on insulator (SOI)

Indexed keywords

LEAKAGE CURRENTS; MOS DEVICES; PLATINUM COMPOUNDS; SILICON ON INSULATOR TECHNOLOGY;

EID: 0038394522     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2002.807717     Document Type: Article
Times cited : (31)

References (7)
  • 1
    • 84939180950 scopus 로고
    • SB-IGFET: An insulated-gate field-effect transistor using Schottky-barrier contacts for source and drain
    • Oct.
    • M. P. Lepselter and S. M. Sze, "SB-IGFET: an insulated-gate field-effect transistor using Schottky-barrier contacts for source and drain," Proc. IEEE, vol. 56, pp. 1400-1401, Oct. 1968.
    • (1968) Proc. IEEE , vol.56 , pp. 1400-1401
    • Lepselter, M.P.1    Sze, S.M.2
  • 2
    • 36449006867 scopus 로고
    • Silicon field-effect transistor based on quantum tunneling
    • J. R. Tucker, C. Wang, and P. A. Carney, "Silicon field-effect transistor based on quantum tunneling," Appl. Phys. Lett., vol. 65, pp. 618-620, 1994.
    • (1994) Appl. Phys. Lett. , vol.65 , pp. 618-620
    • Tucker, J.R.1    Wang, C.2    Carney, P.A.3
  • 5
    • 0038483204 scopus 로고    scopus 로고
    • Effects of sub-gate bias on the operation of Schottky-barrier SOI MOSFET's having nano-scale channel
    • Washington, DC, Aug.
    • H. C. Lin, M. F. Wang, F. J. Ho, J. T. Liu, Y. Li, T. Y. Huang, and S. M. Sze, "Effects of sub-gate bias on the operation of Schottky-barrier SOI MOSFET's having nano-scale channel," in Proc. IEEE Conf. Nanotechnology (NANO), Washington, DC, Aug. 2002, pp. 205-208.
    • (2002) Proc. IEEE Conf. Nanotechnology (NANO) , pp. 205-208
    • Lin, H.C.1    Wang, M.F.2    Ho, F.J.3    Liu, J.T.4    Li, Y.5    Huang, T.Y.6    Sze, S.M.7


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.