Deposition of nanocrystalline cubic silicon carbide films using the hot-filament chemical-vapor-deposition method

Journal of Applied Physics

Volumn 87, Issue 11, 2000, Pages 8155-8158

  Yu, M B ^a   Rusli, ^a   Yoon, S F ^a   Chen, Z M ^b   Ahn, J ^a   Zhang, Q ^a   Chew, K ^a   Cui, J ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b XI'AN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001564044     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.373511     Document Type: Article

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