Structural and optical properties of hydrogenated amorphous silicon carbide films by helicon wave plasma-enhanced chemical vapour deposition

Journal of Physics D: Applied Physics

Volumn 37, Issue 23, 2004, Pages 3304-3308

  Yu, Wei ^a   Lu, Wanbing ^a   Han, Li ^a   Fu, Guangsheng ^a  

^a HEBEI UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; DIAMOND FILMS; ELECTRON CYCLOTRON RESONANCE; ENERGY GAP; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HELICONS; HYDROGENATION; METHANE; OPTICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; SILANES; SILICON CARBIDE; ULTRAVIOLET SPECTROSCOPY; WAVE PLASMA INTERACTIONS;

HELICON WAVE PLASMAS; HOT-FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD); OPTICAL BAND GAP; ULTRAVIOLET-VISIBLE TRANSMITTANCE SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 10644263721     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/37/23/012     Document Type: Article

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