Characteristics of cobalt films deposited by using a remote plasma ALD method with a CpCo(CO)2 precursor

Journal of the Korean Physical Society

Volumn 50, Issue 4, 2007, Pages 1141-1146

  Lee, Keunwoo ^a   Kim, Keunjun ^a   Jeon, Hyeongtag ^a   Lee, Youngjin ^b   Kim, Jeongtae ^b   Yeom, Seungjin ^b  

^a Hanyang University   (South Korea)

^b Hynix Semiconductor Inc   (South Korea)

Author keywords

Co suicide; RPALD; Step coverage

Indexed keywords

EID: 34248342708     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.50.1141     Document Type: Article

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