Effects of processing parameters in the chemical vapor deposition of cobalt from cobalt tricarbonyl nitrosyl

Journal of the Electrochemical Society

Volumn 146, Issue 6, 1999, Pages 2139-2145

  Ivanova, Ana R ^a   Nuesca, Guillermo ^a   Chen, Xiaomeng ^a   Goldberg, Cindy ^a   Kaloyeros, Alain E ^d   Arkles, Barry ^b   Sullivan, John J ^c  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b Gelest Inc   (United States)

^c MKS Instruments   (United States)

^d NONE

Author keywords

[No Author keywords available]

Indexed keywords

COBALT; COBALT COMPOUNDS; ELECTRIC PROPERTIES; FILM GROWTH; INTEGRATED CIRCUITS; MORPHOLOGY; NUCLEATION; ORGANIC POLYMERS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TEXTURES; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICIDES; THERMAL CHEMICAL VAPOR DEPOSITION;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 0032636378     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391904     Document Type: Article

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