Interplay between the deposition mode and microstructure in electrochemically deposited Cu thin films

Thin Solid Films

Volumn 515, Issue 17, 2007, Pages 6698-6706

  Kremmer, K ^a   Yezerska, O ^b   Schreiber, G ^a   Masimov, M ^a   Klemm, V ^a   Schneider, M ^b   Rafaja, D ^a  

^a TU BERGAKADEMIE FREIBERG   (Germany)

^b FRAUNHOFER INSTITUTE FOR MANUFACTURING TECHNOLOGY AND ADVANCED MATERIALS IFAM   (Germany)

Author keywords

Chronoamperometry; Copper; Cyclic voltammetry; Electrochemical deposition; Electron back scatter diffraction; X ray diffraction

Indexed keywords

CHRONOAMPEROMETRY; COPPER DEPOSITS; CYCLIC VOLTAMMETRY; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

DEPOSITION MODE; DIFFUSION CONTROLLED MODE; DISLOCATION DENSITY; ELECTRON BACK SCATTER DIFFRACTION;

THIN FILMS;

EID: 34247634063     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.01.043     Document Type: Article

References (37)

1. Vereecken P.M., Binstead R.A., Deligianni H., and Andricacos P.C. IBM J. Res. Develop. 49 (2005) 3
2. Singer P. Semicond. Int. 6 (1998) 91
3. Andriacos P.C., Uzoh C., Dukovic J.O., Horkans J., and Deligianni H. IBM J. Res. Develop. 42 (1998) 567
4. Braun E. Semicond. Int. 4 (1999) 58
5. Wang T., Lindquist P., Erdemli S., Basol E.C., Zhang R., Uzoh C.E., and Basol B.M. Thin Solid Films 478 (2005) 345
6. Chen K.W., Wang Y.L., Liu C.P., Chang L., and Li F.Y. Thin Solid Films 498 (2006) 50
7. Winand R. Electrochim. Acta 39 (1994) 1091
8. Fischer H. Elektrolytische Abscheidung und Elektrokristallisation von Metallen (1954), Springer-Verlag, Berlin
9. Eigenmann B., and Macherauch E. Mater.wiss. Werkst.tech. 27 (1996) 426
10. Courtney T.H. Mechanical Behavior of Materials (1990), McGraw-Hill, New York
11. Gmelins Handbuch der anorganischen Chemie, 8. Aufl., Verlag Chemie GmbH, Weinheim, 1955.
12. Ungár T., and Borbély A. Appl. Phys. Lett. 69 (1996) 3173
13. Wilkens M. Phys. Status Solidi, A Appl. Res. 2 (1970) 359
14. Ungár T., and Tichy G. Phys. Status Solidi, A Appl. Res. 171 (1999) 425
15. Fricke R. Naturwissenschaften 30 (1942) 544
16. Skriver H.L., and Rosengaard N.M. Phys. Rev., B 46 (1992) 7157
17. Zhang J.M., Ma F., and Xu K.W. Appl. Surf. Sci. 229 (2004) 34
18. Finch G.I. Z. Elektrochem. 54 (1950) 457
19. Reddy A.K.N. J. Electroanal. Chem. 6 (1963) 141
20. Amblard J., and Froment M. Faraday Discuss. 12 (1978) 136
21. Pangarov N.A. J. Electroanal. Chem. 9 (1965) 70
22. Pangarov N.A., and Vitkova S.D. Electrochim. Acta 11 (1966) 1719
23. Rafaja D., Valvoda V., Šikola T., and Spousta J. Thin Solid Films 324 (1998) 198
24. Perry A.J., Valvoda V., and Rafaja D. Thin Solid Films 214 (1992) 169
25. See, e.g., V. Randle: microtexture determination and its applications, 2nd edition, Maney Publishing, UK, 2003.
26. Roisnel T., and Rodriguez-Carvajal J. Mater. Sci. Forum 378-3 (2001) 118
27. Dollase W.A. J. Appl. Crystallogr. 19 (1986) 267
28. Williamson G.K., and Hall W.H. Acta Metall. 1 (1953) 22
29. See, e.g., C.H. Hamann, W. Vielstich: Elektrochemie, Wiley, Weinheim, 1998.
30. Inorganic Crystal Structure Database, FIZ Karlsruhe, 2006.
31. Massalski T.B., Subramanian P.R., Okamoto H., and Kacprzak L. Binary Alloy Phase Diagrams. 2nd edition (1990), ASM International
32. Pantleon K., and Somers M.A.J. Acta Mater. 52 (2004) 4929
33. Pantleon K., and Somers M.A.J. Mater. Sci. Forum 495-497 (2005) 1455
34. Landolt D. Electrochim. Acta 39 (1994) 1075
35. Zhang J.M., Xu K.W., and Ji V. Appl. Surf. Sci. 185 (2002) 177
36. Kahanda G.L.M.K.S., Zou X.-Q., Farrell R., and Wong P.-Z. Phys. Rev. Lett. 68 (1992) 3741
37. Pastor J.M., and Rubio M.A. Phys. Rev. Lett. 76 (1996) 1848