Optical pattern generation using a spatial light modulator for maskless lithography

IEEE Journal on Selected Topics in Quantum Electronics

Volumn 13, Issue 2, 2007, Pages 147-154

  Jung, Il Woong ^a,b   Wang, Jen Shiang ^a,c   Solgaard, Olav ^a,b  

^a IEEE   (United States)

^b Stanford University   (United States)

^c Brion Technologies Inc   (United States)

Author keywords

Maskless lithography; Microelectromechanical systems (MEMS); Micromirror array; Microoptoelectromechanical systems (MOEMS); Piston actuator; Programmable pattern generator; Spatial light modulator (SLM)

Indexed keywords

MASKLESS LITHOGRAPHY; MICROMIRROR ARRAY; MICROOPTOELECTROMECHANICAL SYSTEMS (MOEMS); PISTON ACTUATORS; PROGRAMMABLE PATTERN GENERATOR;

ACTUATORS; LIGHT MODULATION; LIGHT MODULATORS; LITHOGRAPHY; MEMS; MIRRORS;

QUANTUM ELECTRONICS;

EID: 34247544448     PISSN: 1077260X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSTQE.2007.893095     Document Type: Article

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